Inventor · disambiguated record
Teruo Iwata
Also filed as: IWATA TERUO
24 granted patents·5 pending applications·2,447 citations·filing 1991–2012
97Inventor score
Top patents by PatentIndex Score
29 records- 0197US6436193B1Gas processing apparatus baffle member, and gas processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 20, 2002·262 cites·13 claims
- 0297US5382311AStage having electrostatic chuck and plasma processing apparatus using sameTOKYO ELECTRON LTD·Filed 1993·Granted Jan 17, 1995·1k cites·20 claims
- 0396US7718930B2Loading table and heat treating apparatus having the loading tableTOKYO ELECTRON LTD·Filed 2004·Granted May 18, 2010·380 cites·20 claims
- 0490US5314541AReduced pressure processing system and reduced pressure processing methodTOKYO ELECTRON LTD·Filed 1992·Granted May 24, 1994·127 cites·9 claims
- 0585US7931749B2Shower head and film-forming device using the sameTOKYO ELECTRON LTD·Filed 2004·Granted Apr 26, 2011·30 cites·8 claims
- 0684US5133561ASealing deviceTOKYO ELECTRON LTD·Filed 1991·Granted Jul 28, 1992·68 cites·14 claims
- 0783US5753891ATreatment apparatusTOKYO ELECTRON LTD·Filed 1995·Granted May 19, 1998·74 cites·7 claims
- 0882US5240556ASurface-heating apparatus and surface-treating methodTOKYO ELECTRON LTD·Filed 1992·Granted Aug 31, 1993·75 cites·27 claims
- 0981US5455082AReduced pressure processing system and reduced pressure processing methodTOKYO ELECTRON LTD·Filed 1994·Granted Oct 3, 1995·69 cites·8 claims
- 1076US5727634AFire detecting/extinguishing apparatus and water discharging nozzle thereforHOCHIKI CO·Filed 1995·Granted Mar 17, 1998·46 cites·36 claims
- 1175US8143557B2Plane heaterSHIBATA KAZUO·Filed 2007·Granted Mar 27, 2012·8 cites·6 claims
- 1275US5783492APlasma processing method, plasma processing apparatus, and plasma generating apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Jul 21, 1998·50 cites·10 claims
- 1371US5879139AVacuum pump with gas heatingTOKYO ELECTRON LTD·Filed 1996·Granted Mar 9, 1999·41 cites·3 claims
- 1467US6669784B2Gas processing apparatus for object to be processedTOKYO ELECTRON LTD·Filed 2002·Granted Dec 30, 2003·11 cites·10 claims
- 1567US6149729AFilm forming apparatus and methodTOKYO ELECTRON LTD·Filed 1998·Granted Nov 21, 2000·34 cites·17 claims
- 1665US5433780AVacuum processing apparatus and exhaust system that prevents particle contaminationTOKYO ELECTRON LTD·Filed 1993·Granted Jul 18, 1995·36 cites·13 claims
- 1765US5426865AVacuum creating method and apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Jun 27, 1995·38 cites·22 claims
- 1863US7887873B2Gasification monitor, method for detecting mist, film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Feb 15, 2011·0 cites·5 claims
- 1963US6719272B1Valve and vacuum processing device with the valveTOKYO ELECTRON LTD·Filed 2000·Granted Apr 13, 2004·11 cites·15 claims
- 2060US7238238B2Gasification monitor, method for detecting mist, film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Jul 3, 2007·3 cites·11 claims
- 2156US5198755AProbe apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 30, 1993·17 cites·10 claims
- 2253US2009220692A1Method of substrate treatment, recording medium and substrate treating apparatusTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2352US6372048B1Gas processing apparatus for object to be processedTOKYO ELECTRON LTD·Filed 1999·Granted Apr 16, 2002·17 cites·19 claims
- 2452US2006280868A1Method for treating vapor deposition apparatus, method for depositing thin film, vapor deposition apparatus and computer program product for achieving thereofNEC ELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 2551US2012118231A1Substrate processing method, storage medium, and substrate processing apparatusTAKAGI TOSHIO·Filed 2012·Application pending·0 cites
- 2646US2005223987A1Film forming apparatusIWATA TERUO·Filed 2005·Application pending·0 cites
- 2742US5392990AFirefighting double-nozzle deluge gun and control method thereofHOCHIKI CO·Filed 1994·Granted Feb 28, 1995·14 cites·8 claims
- 2836US2011283942A1Film forming apparatus and gas injection memberIWATA TERUO·Filed 2011·Application pending·0 cites
- 2935US6253029B1Vacuum processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jun 26, 2001·5 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →