Inventor · disambiguated record
Tetsuya Kamimura
Also filed as: KAMIMURA TETSUYA
98 granted patents·69 pending applications·161 citations·filing 2007–2025
99Inventor score
Files withFUJIFILM CORP150KAMIMURA TETSUYA10FUJIFILM ELECTRONIC MAT CO LTD2FUJIFILM ELECTRONIC MAT USA INC1FUJIFLM CORP1
Top patents by PatentIndex Score
167 records- 0198US11740557B2Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage methodFUJIFILM CORP·Filed 2022·Granted Aug 29, 2023·6 cites·8 claims
- 0296US12013644B2Method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Jun 18, 2024·2 cites·34 claims
- 0395US11360389B2Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage methodFUJIFILM CORP·Filed 2019·Granted Jun 14, 2022·9 cites·35 claims
- 0495US10884338B2Chemical liquid, chemical liquid storage body, manufacturing method of chemical liquid, and manufacturing method of chemical liquid storage bodyFUJIFILM CORP·Filed 2019·Granted Jan 5, 2021·6 cites·22 claims
- 0593US11372331B2Treatment liquid for manufacturing semiconductor, method of manufacturing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Jun 28, 2022·6 cites·25 claims
- 0693US10942455B2Manufacturing method of semiconductor chip, and kitFUJIFILM CORP·Filed 2019·Granted Mar 9, 2021·6 cites·23 claims
- 0792US11256173B2Treatment liquid for manufacturing semiconductor and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Feb 22, 2022·5 cites·35 claims
- 0891US7927294B2Massaging deviceTSUIN BADO KOGYO KK·Filed 2007·Granted Apr 19, 2011·45 cites·14 claims
- 0990US11747727B2Chemical liquid, chemical liquid storage body, pattern forming method, and kitFUJIFILM CORP·Filed 2019·Granted Sep 5, 2023·4 cites·16 claims
- 1090US11453734B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2019·Granted Sep 27, 2022·6 cites·24 claims
- 1190US11326048B2Member, container, chemical liquid storage body, chemical liquid purification device, and manufacturing tankFUJIFILM CORP·Filed 2019·Granted May 10, 2022·2 cites·35 claims
- 1289US11573489B2Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor deviceFUJIFILM CORP·Filed 2019·Granted Feb 7, 2023·4 cites·14 claims
- 1389US2025321486A1Method for manufacturing semiconductor deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 1488US12448541B2Polishing liquid and chemical mechanical polishing methodFUJIFILM CORP·Filed 2021·Granted Oct 21, 2025·1 cites·21 claims
- 1588US11079677B2Chemical liquid, chemical liquid storage body, and pattern forming methodFUJIFILM CORP·Filed 2019·Granted Aug 3, 2021·4 cites·20 claims
- 1688US10578966B2Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensorFUJIFILM CORP·Filed 2016·Granted Mar 3, 2020·4 cites·54 claims
- 1787US12372873B2Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the sameFUJIFILM CORP·Filed 2023·Granted Jul 29, 2025·0 cites·9 claims
- 1887US8419970B2Silicon nitride polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2009·Granted Apr 16, 2013·12 cites·10 claims
- 1986US12282259B2Liquid chemical, method for producing liquid chemical, and method for analyzing test target solutionFUJIFILM CORP·Filed 2020·Granted Apr 22, 2025·1 cites·18 claims
- 2086US11175585B2Treatment liquid and treatment liquid housing bodyFUJIFILM CORP·Filed 2018·Granted Nov 16, 2021·4 cites·18 claims
- 2184US12481218B2Treatment liquid, method for washing substrate, and method for removing resistFUJIFILM CORP·Filed 2023·Granted Nov 25, 2025·0 cites·17 claims
- 2283US12386265B2Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2024·Granted Aug 12, 2025·0 cites·8 claims
- 2382US10626356B2Treatment liquid and method for washing substrateFUJIFILM CORP·Filed 2018·Granted Apr 21, 2020·1 cites·17 claims
- 2482US8372304B2Polishing slurryFUJIFILM CORP·Filed 2009·Granted Feb 12, 2013·8 cites·13 claims
- 2582US2025271765A1Method of manufacturing semiconductor deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 2681US12169362B2Chemical liquid, chemical liquid storage body, chemical liquid filling method, and chemical liquid storage methodFUJIFILM CORP·Filed 2023·Granted Dec 17, 2024·0 cites·9 claims
- 2781US11733611B2Pattern forming method, method for producing electronic device, and kitFUJIFILM CORP·Filed 2019·Granted Aug 22, 2023·2 cites·21 claims
- 2879US12454405B2Chemical liquid and chemical liquid storage bodyFUJIFILM CORP·Filed 2024·Granted Oct 28, 2025·0 cites·18 claims
- 2979US12311294B2Chemical liquid purification method and chemical liquidFUJIFILM CORP·Filed 2024·Granted May 27, 2025·0 cites·7 claims
- 3079US11892775B2Storage container storing treatment liquid for manufacturing semiconductorFUJIFILM CORP·Filed 2022·Granted Feb 6, 2024·0 cites·19 claims
- 3179US2024100482A1Filtering device, purification device, and method for manufacturing chemical liquidFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 3278US11899369B2Treatment liquid, method for washing substrate, and method for removing resistFUJIFILM CORP·Filed 2022·Granted Feb 13, 2024·0 cites·21 claims
- 3378US2024152055A1Manufacturing method of semiconductor chip, and kitFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3477US12161973B2Filtering device, purification device, and method for manufacturing chemical liquidFUJIFILM CORP·Filed 2023·Granted Dec 10, 2024·0 cites·15 claims
- 3577US9548217B2Etching method of semiconductor substrate, and method of producing semiconductor deviceFUJIFILM CORP·Filed 2015·Granted Jan 17, 2017·2 cites·20 claims
- 3677US8932479B2Polishing liquid and polishing methodKAMIMURA TETSUYA·Filed 2011·Granted Jan 13, 2015·4 cites·22 claims
- 3776US10199210B2Semiconductor substrate treatment liquid, treatment method, and method for manufacturing semiconductor-substrate product using theseFUJIFILM CORP·Filed 2016·Granted Feb 5, 2019·2 cites·26 claims
- 3875US11958005B2Chemical liquid purification method and chemical liquidFUJIFILM CORP·Filed 2022·Granted Apr 16, 2024·0 cites·6 claims
- 3975US2025237957A1Liquid chemical, method for producing liquid chemical, and method for analyzing test target solutionFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 4074US12313976B2Storage container storing treatment liquid for manufacturing semiconductorFUJIFILM CORP·Filed 2022·Granted May 27, 2025·0 cites·4 claims
- 4174US8647523B2Etching compositionTAKAHASHI TOMONORI·Filed 2012·Granted Feb 11, 2014·3 cites·30 claims
- 4273US12434997B2Chemical liquid storage bodyFUJIFILM CORP·Filed 2024·Granted Oct 7, 2025·0 cites·20 claims
- 4373US11914300B2Manufacturing method of semiconductor chip, and kitFUJIFILM CORP·Filed 2021·Granted Feb 27, 2024·0 cites·6 claims
- 4472US12372868B2Pattern forming method, kit, and resist compositionFUJIFILM CORP·Filed 2023·Granted Jul 29, 2025·0 cites·13 claims
- 4572US12343681B2Filter device, purification device, chemical solution production methodFUJIFILM CORP·Filed 2023·Granted Jul 1, 2025·0 cites·14 claims
- 4672US11392046B2Quality inspection method for chemical liquidFUJIFILM CORP·Filed 2019·Granted Jul 19, 2022·1 cites·31 claims
- 4771US8940644B2Method of producing a semiconductor substrate product and etching liquidFUJIFILM CORP·Filed 2013·Granted Jan 27, 2015·3 cites·24 claims
- 4871US2023333478A1Pattern forming method, method for producing electronic device, and kitFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4970US12235584B2Chemical liquid, chemical liquid storage body, resist pattern forming method, and semiconductor chip manufacturing methodFUJIFILM CORP·Filed 2021·Granted Feb 25, 2025·0 cites·22 claims
- 5070US12228857B2Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor deviceFUJIFILM CORP·Filed 2022·Granted Feb 18, 2025·0 cites·4 claims
Showing the top 50 of 167 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →