Inventor · disambiguated record
Tetsuo Takada
Also filed as: TAKADA TETSUO
11 granted patents·1 pending application·114 citations·filing 1986–2023
86Inventor score
Files withDAINIPPON INK & CHEMICALS4FUJIFILM CORP3KAWAMURA INST CHEM RES2HARAGUCHI KAZUTOSHI1NIPPON LIGHT METAL CO1
Top patents by PatentIndex Score
12 records- 0183US7357864B2Microfluidic deviceKAWAMURA INST CHEM RES·Filed 2004·Granted Apr 15, 2008·33 cites·9 claims
- 0283US4795294AFixing device for brittle board such as plasterboardNIPPON LIGHT METAL CO·Filed 1986·Granted Jan 3, 1989·67 cites·15 claims
- 0381US7993892B2Production of organic/inorganic composite hydrogelKAWAMURA INST CHEM RES·Filed 2005·Granted Aug 9, 2011·9 cites·12 claims
- 0480US10689474B2Method for producing semi-IPN composite, and method for producing synthetic leatherDAINIPPON INK & CHEMICALS·Filed 2016·Granted Jun 23, 2020·2 cites·3 claims
- 0571US11441120B2Cell culture substrateFUJIFILM CORP·Filed 2017·Granted Sep 13, 2022·1 cites·20 claims
- 0671US8530564B2Organic-inorganic composite dispersion, cell culture substrate manufactured using the same, and methods for preparing the sameTAKADA TETSUO·Filed 2009·Granted Sep 10, 2013·2 cites·24 claims
- 0765US2023220321A1Organic-inorganic composite dispersion liquid and method for producing sameFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 0857US10647872B2Moisture-permeable filmDAINIPPON INK & CHEMICALS·Filed 2016·Granted May 12, 2020·0 cites·3 claims
- 0954US11499136B2Cell culture substrateFUJIFILM CORP·Filed 2017·Granted Nov 15, 2022·0 cites·13 claims
- 1051US9951308B2Temperature-responsive cell culture substrate and method for producing sameDAINIPPON INK & CHEMICALS·Filed 2014·Granted Apr 24, 2018·0 cites·8 claims
- 1148US10626272B2Method for producing semi-IPN composite and method for producing moisture-permeable filmDAINIPPON INK & CHEMICALS·Filed 2016·Granted Apr 21, 2020·0 cites·6 claims
- 1237US9474835B2Block copolymer and antithrombotic coating agentHARAGUCHI KAZUTOSHI·Filed 2012·Granted Oct 25, 2016·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →