Inventor · disambiguated record
Teruyoshi Yao
Also filed as: YAO TERUYOSHI
11 granted patents·1 pending application·107 citations·filing 1995–2012
88Inventor score
Top patents by PatentIndex Score
12 records- 0179US5750316AManufacture of semiconductor device using a-c anti-reflection coatingFUJITSU LTD·Filed 1995·Granted May 12, 1998·48 cites·6 claims
- 0278US7732103B2Photomask, focus measurement apparatus and focus measurement methodFUJITSU SEMICONDUCTOR LTD·Filed 2006·Granted Jun 8, 2010·5 cites·19 claims
- 0378US7601471B2Apparatus and method for correcting pattern dimension and photo mask and test photo maskFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Oct 13, 2009·5 cites·18 claims
- 0476US7240307B2Pattern size correcting device and pattern size correcting methodFUJITSU LTD·Filed 2005·Granted Jul 3, 2007·5 cites·36 claims
- 0570US6986973B2Test photomask, flare evaluation method, and flare compensation methodFUJITSU LTD·Filed 2003·Granted Jan 17, 2006·15 cites·25 claims
- 0666US6420095B1Manufacture of semiconductor device using A-C anti-reflection coatingFUJITSU LTD·Filed 1999·Granted Jul 16, 2002·25 cites·9 claims
- 0763US7604912B2Local flare correctionFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Oct 20, 2009·1 cites·20 claims
- 0854US7732107B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureFUJITSU SEMICONDUCTOR LTD·Filed 2004·Granted Jun 8, 2010·3 cites·1 claims
- 0950US8553198B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2012·Granted Oct 8, 2013·0 cites·2 claims
- 1045US8227153B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2010·Granted Jul 24, 2012·0 cites·1 claims
- 1145US7479356B2Aligning methodFUJITSU LTD·Filed 2008·Granted Jan 20, 2009·0 cites·10 claims
- 1239US2005095513A1PhotomaskFUJITSU LTD·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →