Inventor · disambiguated record
Thomas H. Baum
Also filed as: BAUM THOMAS H · BAUM THOMAS HALL
257 granted patents·58 pending applications·9,373 citations·filing 1984–2025
99Inventor score
Top patents by PatentIndex Score
315 records- 0199US7437060B2Delivery systems for efficient vaporization of precursor source materialADVANCED TECH MATERIALS·Filed 2005·Granted Oct 14, 2008·561 cites·20 claims
- 0299US6909839B2Delivery systems for efficient vaporization of precursor source materialADVANCED TECH MATERIALS·Filed 2003·Granted Jun 21, 2005·610 cites·21 claims
- 0398US7838329B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Nov 23, 2010·55 cites·21 claims
- 0498US7475588B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Jan 13, 2009·474 cites·64 claims
- 0598US7296460B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Nov 20, 2007·481 cites·23 claims
- 0698US7080545B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2002·Granted Jul 25, 2006·495 cites·81 claims
- 0798US5840897AMetal complex source reagents for chemical vapor depositionADVANCED TECH MATERIALS·Filed 1995·Granted Nov 24, 1998·275 cites·9 claims
- 0897US11685752B2Process for preparing organotin compoundsENTEGRIS INC·Filed 2022·Granted Jun 27, 2023·8 cites·13 claims
- 0997US11358975B2Process for preparing organotin compoundsENTEGRIS INC·Filed 2021·Granted Jun 14, 2022·15 cites·18 claims
- 1097US9537095B2Tellurium compounds useful for deposition of tellurium containing materialsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·14 cites·20 claims
- 1197US6596236B2Micro-machined thin film sensor arrays for the detection of H2 containing gases, and method of making and using the sameADVANCED TECH MATERIALS·Filed 2001·Granted Jul 22, 2003·129 cites·43 claims
- 1297US6379748B1Tantalum amide precursors for deposition of tantalum nitride on a substrateADVANCED TECH MATERIALS·Filed 2000·Granted Apr 30, 2002·211 cites·16 claims
- 1397US6015917ATantalum amide precursors for deposition of tantalum nitride on a substrateADVANCED TECH MATERIALS·Filed 1998·Granted Jan 18, 2000·317 cites·4 claims
- 1497US4574095ASelective deposition of copperIBM·Filed 1984·Granted Mar 4, 1986·144 cites·7 claims
- 1596US10392700B2Solid vaporizerENTEGRIS INC·Filed 2015·Granted Aug 27, 2019·14 cites·15 claims
- 1696US8796068B2Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2013·Granted Aug 5, 2014·12 cites·10 claims
- 1796US7910765B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2010·Granted Mar 22, 2011·19 cites·20 claims
- 1896US7887883B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2010·Granted Feb 15, 2011·23 cites·8 claims
- 1996US7863203B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameADVANCED TECH MATERIALS·Filed 2008·Granted Jan 4, 2011·19 cites·16 claims
- 2096US7786320B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2009·Granted Aug 31, 2010·29 cites·7 claims
- 2196US7713346B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2008·Granted May 11, 2010·31 cites·8 claims
- 2296US7323581B1Source reagent compositions and method for forming metal films on a substrate by chemical vapor depositionADVANCED TECH MATERIALS·Filed 2000·Granted Jan 29, 2008·56 cites·8 claims
- 2396US6773873B2pH buffered compositions useful for cleaning residue from semiconductor substratesADVANCED TECH MATERIALS·Filed 2002·Granted Aug 10, 2004·115 cites·14 claims
- 2496US6346741B1Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using sameADVANCED TECH MATERIALS·Filed 1998·Granted Feb 12, 2002·224 cites·17 claims
- 2596US6110529AMethod of forming metal films on a substrate by chemical vapor depositionADVANCED TECH MATERIALS·Filed 1995·Granted Aug 29, 2000·276 cites·38 claims
- 2696US5820664APrecursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising sameADVANCED TECH MATERIALS·Filed 1995·Granted Oct 13, 1998·266 cites·19 claims
- 2795US9038855B2Fluid processing systems and methodsLURCOTT STEVEN M·Filed 2010·Granted May 26, 2015·48 cites·18 claims
- 2895US8802882B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsWANG ZIYUN·Filed 2010·Granted Aug 12, 2014·15 cites·20 claims
- 2995US8242032B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameWANG ZIYUN·Filed 2011·Granted Aug 14, 2012·7 cites·8 claims
- 3095US8008117B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Aug 30, 2011·14 cites·20 claims
- 3195US7361603B2Passivative chemical mechanical polishing composition for copper film planarizationADVANCED TECH MATERIALS·Filed 2005·Granted Apr 22, 2008·25 cites·40 claims
- 3295US7005392B2Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using sameADVANCED TECH MATERIALS·Filed 2001·Granted Feb 28, 2006·71 cites·9 claims
- 3395US6869638B2Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using sameADVANCED TEHNOLOGY MATERIALS I·Filed 2001·Granted Mar 22, 2005·108 cites·46 claims
- 3495US5919522AGrowth of BaSrTiO3 using polyamine-based precursorsADVANCED TECH MATERIALS·Filed 1997·Granted Jul 6, 1999·149 cites·22 claims
- 3594US8236097B2Composition and method for low temperature deposition of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Aug 7, 2012·13 cites·5 claims
- 3694US7531679B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2002·Granted May 12, 2009·55 cites·22 claims
- 3794US7285308B2Chemical vapor deposition of high conductivity, adherent thin films of rutheniumADVANCED TECH MATERIALS·Filed 2004·Granted Oct 23, 2007·45 cites·79 claims
- 3894US7241912B2Copper (I) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2005·Granted Jul 10, 2007·12 cites·10 claims
- 3994US7198815B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2005·Granted Apr 3, 2007·19 cites·8 claims
- 4094US6409781B1Polishing slurries for copper and associated materialsADVANCED TECH MATERIALS·Filed 2000·Granted Jun 25, 2002·71 cites·42 claims
- 4194US6399208B1Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin filmsADVANCED TECH MATERIALS·Filed 1999·Granted Jun 4, 2002·91 cites·71 claims
- 4294US6006582AHydrogen sensor utilizing rare earth metal thin film detection elementADVANCED TECH MATERIALS·Filed 1998·Granted Dec 28, 1999·137 cites·49 claims
- 4393US9102693B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2014·Granted Aug 11, 2015·8 cites·20 claims
- 4493US8951948B2Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal compositionRATH MELISSA K·Filed 2006·Granted Feb 10, 2015·21 cites·15 claims
- 4593US8877549B2Low temperature deposition of phase change memory materialsADVANCED TECH MATERIALS·Filed 2014·Granted Nov 4, 2014·7 cites·19 claims
- 4693US8288198B2Low temperature deposition of phase change memory materialsROEDER JEFFREY F·Filed 2007·Granted Oct 16, 2012·11 cites·18 claims
- 4793US8268665B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsHUNKS WILLIAM·Filed 2011·Granted Sep 18, 2012·12 cites·20 claims
- 4893US7781605B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2009·Granted Aug 24, 2010·14 cites·20 claims
- 4993US7371878B2Tantalum amide complexes for depositing tantalum-containing films, and method of making sameADVANCED TECH MATERIALS·Filed 2007·Granted May 13, 2008·14 cites·20 claims
- 5093US6277436B1Liquid delivery MOCVD process for deposition of high frequency dielectric materialsADVANCED TECH MATERIALS·Filed 1998·Granted Aug 21, 2001·147 cites·26 claims
Showing the top 50 of 315 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →