Inventor · disambiguated record
Thomas Nowak
Also filed as: NOWAK THOMAS · NOWAK THOMAS E
56 granted patents·27 pending applications·4,452 citations·filing 1987–2023
99Inventor score
Files withAPPLIED MATERIALS INC51RAJAGOPALAN NAGARAJAN4YANG YAO-HUNG3JANAKIRAMAN KARTHIK2KASZUBA ANDRZEI2
Top patents by PatentIndex Score
83 records- 0199US6863019B2Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·608 cites·6 claims
- 0298US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0398US8911553B2Quartz showerhead for nanocure UV chamberBALUJA SANJEEV·Filed 2011·Granted Dec 16, 2014·479 cites·9 claims
- 0498US7566891B2Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Jul 28, 2009·553 cites·33 claims
- 0597US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0697US8492170B2UV assisted silylation for recovery and pore sealing of damaged low K filmsXIE BO·Filed 2011·Granted Jul 23, 2013·522 cites·20 claims
- 0797US8338809B2Ultraviolet reflector with coolant gas holes and methodYANG YAO-HUNG·Filed 2011·Granted Dec 25, 2012·408 cites·23 claims
- 0897US7692171B2Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectorsKASZUBA ANDRZEI·Filed 2007·Granted Apr 6, 2010·471 cites·26 claims
- 0997US7572337B2Blocker plate bypass to distribute gases in a chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2005·Granted Aug 11, 2009·43 cites·15 claims
- 1096US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 1196US7663121B2High efficiency UV curing systemAPPLIED MATERIALS INC·Filed 2006·Granted Feb 16, 2010·38 cites·12 claims
- 1296US7589336B2Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Sep 15, 2009·39 cites·23 claims
- 1395US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 1495US7777198B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·29 cites·30 claims
- 1595US6329297B1Dilute remote plasma cleanAPPLIED MATERIALS INC·Filed 2000·Granted Dec 11, 2001·733 cites·19 claims
- 1694US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 1793US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 1893US8203126B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationROCHA-ALVAREZ JUAN CARLOS·Filed 2010·Granted Jun 19, 2012·26 cites·15 claims
- 1993US7909595B2Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sectionsAPPLIED MATERIALS INC·Filed 2007·Granted Mar 22, 2011·18 cites·7 claims
- 2090US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 2190US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 2290US6366346B1Method and apparatus for optical detection of effluent compositionAPPLIED MATERIALS INC·Filed 1998·Granted Apr 2, 2002·89 cites·34 claims
- 2388US10570517B2Apparatus and method for UV treatment, chemical treatment, and depositionAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·20 claims
- 2488US9506145B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2016·Granted Nov 29, 2016·3 cites·20 claims
- 2588US9364871B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2013·Granted Jun 14, 2016·4 cites·11 claims
- 2688US8216861B1Dielectric recovery of plasma damaged low-k films by UV-assisted photochemical depositionYIM KANG SUB·Filed 2011·Granted Jul 10, 2012·14 cites·10 claims
- 2787US9870935B2Monitoring system for deposition and method of operation thereofAPPLIED MATERIALS INC·Filed 2015·Granted Jan 16, 2018·4 cites·7 claims
- 2887US8283237B2Fabrication of through-silicon vias on silicon wafersRAJAGOPALAN NAGARAJAN·Filed 2010·Granted Oct 9, 2012·11 cites·34 claims
- 2987US7964858B2Ultraviolet reflector with coolant gas holes and methodAPPLIED MATERIALS INC·Filed 2008·Granted Jun 21, 2011·21 cites·44 claims
- 3085US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 3185US8563095B2Silicon nitride passivation layer for covering high aspect ratio featuresRAJAGOPALAN NAGARAJAN·Filed 2010·Granted Oct 22, 2013·11 cites·35 claims
- 3285US8274017B2Multifunctional heater/chiller pedestal for wide range wafer temperature controlYAP LIPYEOW·Filed 2009·Granted Sep 25, 2012·12 cites·20 claims
- 3384US7699935B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 20, 2010·3 cites·6 claims
- 3483US4874277AWall fastener and method of fabricationVASSILIOU EUSTATHIOS·Filed 1987·Granted Oct 17, 1989·29 cites·3 claims
- 3582US8309421B2Dual-bulb lamphead control methodologyYANG YAO-HUNG·Filed 2011·Granted Nov 13, 2012·5 cites·17 claims
- 3681US8679987B2Deposition of an amorphous carbon layer with high film density and high etch selectivityREILLY PATRICK·Filed 2012·Granted Mar 25, 2014·7 cites·20 claims
- 3780US10094486B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·1 cites·14 claims
- 3880US8329575B2Fabrication of through-silicon vias on silicon wafersRAJAGOPALAN NAGARAJAN·Filed 2010·Granted Dec 11, 2012·6 cites·24 claims
- 3978US6843881B2Detecting chemiluminescent radiation in the cleaning of a substrate processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jan 18, 2005·17 cites·15 claims
- 4077US8597011B2Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sectionsKASZUBA ANDRZEI·Filed 2010·Granted Dec 3, 2013·3 cites·18 claims
- 4176US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 4275US7628863B2Heated gas box for PECVD applicationsAPPLIED MATERIALS INC·Filed 2004·Granted Dec 8, 2009·20 cites·10 claims
- 4375US7554103B2Increased tool utilization/reduction in MWBC for UV curing chamberAPPLIED MATERIALS INC·Filed 2006·Granted Jun 30, 2009·5 cites·25 claims
- 4473US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 4572US9206511B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Dec 8, 2015·0 cites·17 claims
- 4671US2010012273A1Method and System for Supplying a Cleaning Gas Into a Process ChamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4770US7371427B2Reduction of hillocks prior to dielectric barrier deposition in Cu damasceneAPPLIED MATERIALS INC·Filed 2003·Granted May 13, 2008·11 cites·6 claims
- 4868US6868856B2Enhanced remote plasma cleaningAPPLIED MATERIALS INC·Filed 2001·Granted Mar 22, 2005·9 cites·18 claims
- 4966US8591699B2Method and system for supplying a cleaning gas into a process chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2012·Granted Nov 26, 2013·0 cites·20 claims
- 5065US2009236214A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2008·Application pending·0 cites
Showing the top 50 of 83 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →