Inventor · disambiguated record
Thomas Scheruebl
Also filed as: SCHERUEBL THOMAS · SCHERUEBL THOMAS FRANZ KARL
17 granted patents·5 pending applications·198 citations·filing 1998–2025
92Inventor score
Files withZEISS CARL SMT GMBH4ZEISS CARL SMS GMBH3ZEISS CARL JENA GMBH2ARNZ MICHAEL1CARL ZEISS MICROELECTRIC SYSTE1
Top patents by PatentIndex Score
22 records- 0190US6674572B1Confocal microscopic deviceZEISS CARL JENA GMBH·Filed 1998·Granted Jan 6, 2004·119 cites·12 claims
- 0280US11079338B2Method for detecting a structure of a lithography mask and device for carrying out the methodZEISS CARL SMT GMBH·Filed 2019·Granted Aug 3, 2021·2 cites·30 claims
- 0378US8730474B2Method and apparatus for measuring of masks for the photo-lithographySCHERUEBL THOMAS·Filed 2009·Granted May 20, 2014·7 cites·25 claims
- 0477US12001145B2Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation modelZEISS CARL SMT GMBH·Filed 2019·Granted Jun 4, 2024·1 cites·22 claims
- 0575US6825454B2Automatic focusing device for an optical applianceZEISS CARL MICROELECTRONIC SYS·Filed 2002·Granted Nov 30, 2004·28 cites·16 claims
- 0672US9261775B2Method for analyzing a photomaskZEISS CARL SMS GMBH·Filed 2014·Granted Feb 16, 2016·3 cites·21 claims
- 0772US8718354B2Method for analyzing masks for photolithographySTROESSNER ULRICH·Filed 2009·Granted May 6, 2014·4 cites·20 claims
- 0870US10572990B2Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing systemNUFLARE TECHNOLOGY INC·Filed 2017·Granted Feb 25, 2020·2 cites·11 claims
- 0968US11774870B2Method for removing a particle from a mask systemZEISS CARL SMT GMBH·Filed 2022·Granted Oct 3, 2023·0 cites·24 claims
- 1064US2025237960A1Methods, computer programs and apparatuses for treating an optical element for the extreme ultraviolet wavelength rangeZEISS CARL SMS LTD·Filed 2025·Application pending·0 cites
- 1158US7286284B2Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionZEISS CARL SMS GMBH·Filed 2004·Granted Oct 23, 2007·13 cites·34 claims
- 1257USRE44216EMicroscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionTOTZECK MICHAEL·Filed 2009·Granted May 14, 2013·0 cites·35 claims
- 1357US6894837B2Imaging system for an extreme ultraviolet (EUV) beam-based microscopeCARL ZEISS MICROELECTRIC SYSTE·Filed 2003·Granted May 17, 2005·6 cites·11 claims
- 1454US7525115B2Arrangement for inspecting objects, especially masks in microlithographyZEISS CARL SMS GMBH·Filed 2004·Granted Apr 28, 2009·3 cites·6 claims
- 1549US8731273B2Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by sectionARNZ MICHAEL·Filed 2009·Granted May 20, 2014·0 cites·26 claims
- 1645US10578975B2Method for correcting the critical dimension uniformity of a photomask for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·11 claims
- 1741US6307690B1Microscope with light sourceZEISS CARL JENA GMBH·Filed 1999·Granted Oct 23, 2001·10 cites·6 claims
- 1839US2006028706A1Polarizer device for generating a defined spatial distribution of polarization statesZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1936US2003164440A1Autofocussing device for optical instrumentsFiled 2001·Application pending·0 cites
- 2035US2003112504A1Arrangement for confocal autofocussingFiled 2001·Application pending·0 cites
- 2135US2004021936A1Microscope with and automatic focusing deviceFiled 2002·Application pending·0 cites
- 2234US8264535B2Method and apparatus for analyzing a group of photolithographic masksKIENZLE OLIVER·Filed 2008·Granted Sep 11, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →