Inventor · disambiguated record
Tina Li
Also filed as: LI TINA · LI TINA C
9 granted patents·1 pending application·16 citations·filing 2013–2020
82Inventor score
Top patents by PatentIndex Score
10 records- 0190US9567491B2Tungsten chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Feb 14, 2017·7 cites·41 claims
- 0287US10920107B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2020·Granted Feb 16, 2021·2 cites·14 claims
- 0387US10619076B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2019·Granted Apr 14, 2020·2 cites·8 claims
- 0481US10619075B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2018·Granted Apr 14, 2020·1 cites·10 claims
- 0576US10344186B2Polishing composition comprising an amine-containing surfactantCABOT MICROELECTRONICS CORP·Filed 2017·Granted Jul 9, 2019·1 cites·19 claims
- 0673US9771496B2Tungsten-processing slurry with cationic surfactant and cyclodextrinCABOT MICROELECTRONICS CORP·Filed 2015·Granted Sep 26, 2017·1 cites·22 claims
- 0770US9165489B2CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivityCABOT MICROELECTRONICS CORP·Filed 2014·Granted Oct 20, 2015·2 cites·21 claims
- 0857US9796882B2CMP processing composition comprising alkylamine and cyclodextrinCABOT MICROELECTRONICS CORP·Filed 2016·Granted Oct 24, 2017·0 cites·17 claims
- 0950US2014238868A1Electroplating bathLLC ROHM AND HAAS ELECTRONIC MATERIALS·Filed 2013·Application pending·0 cites
- 1046US10301508B2Polishing composition comprising cationic polymer additiveCABOT MICROELECTRONICS CORP·Filed 2017·Granted May 28, 2019·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →