Inventor · disambiguated record
Tomoyuki Adaniya
Also filed as: ADANIYA TOMOYUKI
3 granted patents·5 pending applications·3 citations·filing 2011–2022
54Inventor score
Top patents by PatentIndex Score
8 records- 0161US9365770B2Etching solution for copper/molybdenum-based multilayer thin filmOKABE SATOSHI·Filed 2012·Granted Jun 14, 2016·2 cites·16 claims
- 0253US8980121B2Etching liquid for a copper/titanium multilayer thin filmADANIYA TOMOYUKI·Filed 2011·Granted Mar 17, 2015·1 cites·18 claims
- 0348US9365934B2Liquid composition used in etching copper- and titanium-containing multilayer film, etching method in which said composition is used, method for manufacturing multilayer-film wiring, and substrateMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·0 cites·15 claims
- 0448US2024047224A1Recess etching solution, recess etching method, and surface-treated semiconductor substrate manufacturing methodMITSUBISHI GAS CHEMICAL CO·Filed 2021·Application pending·0 cites
- 0547US2024170278A1Method for producing semiconductor substrate for memory elementsMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0646US2024117277A1Composition for cleaning semiconductor substrate, method for cleaning semiconductor substrate, and method for producing semiconductor substrateMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0745US2024287385A1Etching composition for semiconductor substrate for memory element and method for manufacturing semiconductor substrate for memory element using sameMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0829US2012319033A1Etching solution for multilayer thin film having copper layer and molybdenum layer contained thereinOKABE SATOSHI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →