Inventor · disambiguated record
Tom Choi
Also filed as: CHOI TOM · CHOI TOM K
12 granted patents·2 pending applications·216 citations·filing 2015–2021
89Inventor score
Files withAPPLIED MATERIALS INC14
Top patents by PatentIndex Score
14 records- 0198US9478433B1Cyclic spacer etching process with improved profile controlAPPLIED MATERIALS INC·Filed 2015·Granted Oct 25, 2016·109 cites·20 claims
- 0296US10026621B2SiN spacer profile patterningAPPLIED MATERIALS INC·Filed 2016·Granted Jul 17, 2018·93 cites·20 claims
- 0387US9721807B2Cyclic spacer etching process with improved profile controlAPPLIED MATERIALS INC·Filed 2016·Granted Aug 1, 2017·4 cites·17 claims
- 0481US10424487B2Atomic layer etching processesAPPLIED MATERIALS INC·Filed 2017·Granted Sep 24, 2019·3 cites·19 claims
- 0578US10403507B2Shaped etch profile with oxidationAPPLIED MATERIALS INC·Filed 2017·Granted Sep 3, 2019·2 cites·17 claims
- 0672US10600639B2SiN spacer profile patterningAPPLIED MATERIALS INC·Filed 2018·Granted Mar 24, 2020·1 cites·20 claims
- 0771US9818621B2Cyclic oxide spacer etch processAPPLIED MATERIALS INC·Filed 2017·Granted Nov 14, 2017·2 cites·20 claims
- 0868US10770269B2Apparatus and methods for reducing particles in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2017·Granted Sep 8, 2020·0 cites·9 claims
- 0968US10629473B2Footing removal for nitride spacerAPPLIED MATERIALS INC·Filed 2016·Granted Apr 21, 2020·1 cites·20 claims
- 1068US10062575B2Poly directional etch by oxidationAPPLIED MATERIALS INC·Filed 2016·Granted Aug 28, 2018·1 cites·20 claims
- 1156US2020043734A1Systems and methods for material breakthroughAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1252US12374584B2Multi color stack for self aligned dual pattern formation for multi purpose device structuresAPPLIED MATERIALS INC·Filed 2021·Granted Jul 29, 2025·0 cites·19 claims
- 1343US10354889B2Non-halogen etching of silicon-containing materialsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·0 cites·20 claims
- 1435US2016307772A1Spacer formation process with flat top profileAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →