Inventor · disambiguated record
Toshiaki Fujisato
Also filed as: FUJISATO TOSHIAKI
13 granted patents·10 pending applications·124 citations·filing 2000–2020
88Inventor score
Top patents by PatentIndex Score
23 records- 0193US7337745B1Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptorTOKYO ELECTRON LTD·Filed 2000·Granted Mar 4, 2008·83 cites·7 claims
- 0290US8194384B2High temperature electrostatic chuck and method of usingNASMAN RONALD·Filed 2008·Granted Jun 5, 2012·27 cites·37 claims
- 0387US11396704B2Substrate holder and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 26, 2022·3 cites·19 claims
- 0486US11104991B2Processing apparatus and cover memberTOKYO ELECTRON LTD·Filed 2017·Granted Aug 31, 2021·2 cites·5 claims
- 0584US11441224B2Method of controlling substrate processing apparatus, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 13, 2022·2 cites·12 claims
- 0679US8592712B2Mounting table structure and plasma film forming apparatusFUJISATO TOSHIAKI·Filed 2010·Granted Nov 26, 2013·6 cites·12 claims
- 0771US10998204B2Method of processing substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 4, 2021·1 cites·11 claims
- 0861US2012315404A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingLI YICHENG·Filed 2012·Application pending·0 cites
- 0957US2007116872A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1055US2009242383A1Apparatus and method for rf grounding of ipvd tableTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1144US11280002B2Placement apparatus and processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·12 claims
- 1244US10340176B2Substrate mounting method and substrate mounting deviceTOKYO ELECTRON LTD·Filed 2017·Granted Jul 2, 2019·0 cites·8 claims
- 1342US9253862B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Feb 2, 2016·0 cites·10 claims
- 1442US2007116873A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1541US11466365B2Film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 11, 2022·0 cites·12 claims
- 1641US2021005493A1Processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1740US2003119328A1Plasma processing apparatus, and cleaning method thereforTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 1840US2008087220A1Plasma Processing Apparatus and Multi-Chamber SystemTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1940US2014060572A1Plasma processing apparatus and cleaning method for removing metal oxide filmTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2037US2003141017A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 2137US2012247949A1Film forming method, resputtering method, and film forming apparatusSAKUMA TAKASHI·Filed 2012·Application pending·0 cites
- 2236US10522467B2Ruthenium wiring and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2017·Granted Dec 31, 2019·0 cites·13 claims
- 2333US9324600B2Mounting table structure and plasma film forming apparatusFUJISATO TOSHIAKI·Filed 2010·Granted Apr 26, 2016·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →