Inventor · disambiguated record
Toralf Gruner
Also filed as: GRUNER TORALF · LOERING ULRICH
128 granted patents·46 pending applications·663 citations·filing 2001–2025
99Inventor score
Top patents by PatentIndex Score
174 records- 0197US11003088B2Method and device for the correction of imaging defectsZEISS CARL SMT GMBH·Filed 2020·Granted May 11, 2021·6 cites·20 claims
- 0295US11415895B2Compensation of creep effects in an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Granted Aug 16, 2022·4 cites·20 claims
- 0395US10120176B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2017·Granted Nov 6, 2018·4 cites·17 claims
- 0495US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0595US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0694US7256932B2Optical system for ultraviolet lightZEISS CARL SMT AG·Filed 2005·Granted Aug 14, 2007·38 cites·32 claims
- 0794US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 0893US11809085B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Nov 7, 2023·2 cites·22 claims
- 0993US8325322B2Optical correction deviceHAUF MARKUS·Filed 2010·Granted Dec 4, 2012·16 cites·20 claims
- 1093US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 1193US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 1293US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 1392US8508854B2Optical element and methodEVA ERIC·Filed 2010·Granted Aug 13, 2013·12 cites·59 claims
- 1491US6728043B2Microlithographic illumination method and a projection lens for carrying out the methodZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 27, 2004·44 cites·53 claims
- 1590US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 1689US8379188B2Optical systemZEISS CARL SMT GMBH·Filed 2010·Granted Feb 19, 2013·11 cites·36 claims
- 1789US8237918B2Optical system of a microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2009·Granted Aug 7, 2012·11 cites·27 claims
- 1888US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 1987US7551263B2Device for adjusting the illumination dose on a photosensitive layerZEISS CARL SMT AG·Filed 2006·Granted Jun 23, 2009·9 cites·3 claims
- 2086US8310752B2Method of manufacturing a projection objective and projection objectiveFELDMANN HEIKO·Filed 2009·Granted Nov 13, 2012·7 cites·5 claims
- 2186US7239450B2Method of determining lens materials for a projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jul 3, 2007·16 cites·48 claims
- 2285US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
- 2384US7589903B2Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production methodZEISS CARL SMT AG·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 2483US8891172B2Optical element and methodEVA ERIC·Filed 2009·Granted Nov 18, 2014·7 cites·7 claims
- 2582US9274327B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2014·Granted Mar 1, 2016·3 cites·23 claims
- 2681US11143967B2Projection exposure method and projection lens with setting of the pupil transmissionZEISS CARL SMT GMBH·Filed 2019·Granted Oct 12, 2021·2 cites·20 claims
- 2781US9459435B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodZEISS CARL SMT GMBH·Filed 2016·Granted Oct 4, 2016·2 cites·21 claims
- 2881US8896814B2Catadioptric projection objective comprising deflection mirrors and projection exposure methodSCHICKETANZ THOMAS·Filed 2012·Granted Nov 25, 2014·5 cites·17 claims
- 2980US10684466B2Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangementZEISS CARL SMT GMBH·Filed 2018·Granted Jun 16, 2020·3 cites·19 claims
- 3080US7423765B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Sep 9, 2008·6 cites·23 claims
- 3180US7027237B2Method for improving the imaging properties of at least two optical elements and photolithographic fabrication methodZEISS CARL SMT AG·Filed 2005·Granted Apr 11, 2006·9 cites·10 claims
- 3279US11366395B2Mirror, in particular for a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·15 claims
- 3379US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 3479US9146475B2Projection exposure system and projection exposure methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 29, 2015·3 cites·33 claims
- 3578US11187990B2Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirrorZEISS CARL SMT GMBH·Filed 2021·Granted Nov 30, 2021·1 cites·15 claims
- 3678US10908509B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Feb 2, 2021·3 cites·20 claims
- 3777US8159648B2Method and device for the correction of imaging defectsSORG FRANZ·Filed 2008·Granted Apr 17, 2012·3 cites·8 claims
- 3877US7733501B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Jun 8, 2010·4 cites·23 claims
- 3977US7126765B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Oct 24, 2006·3 cites·14 claims
- 4076US7777963B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Aug 17, 2010·3 cites·53 claims
- 4175US9759550B2Projection exposure apparatus for microlithography comprising an optical distance measurement systemZEISS CARL SMT GMBH·Filed 2015·Granted Sep 12, 2017·2 cites·20 claims
- 4275US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 4375US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 4475US8446665B2Catadioptric projection objectiveEPPLE ALEXANDER·Filed 2009·Granted May 21, 2013·2 cites·26 claims
- 4574US9785054B2Mirror, more particularly for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Oct 10, 2017·3 cites·20 claims
- 4674US9684251B2Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jun 20, 2017·2 cites·24 claims
- 4774US9671703B2Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·2 cites·24 claims
- 4874US8854606B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemMANN HANS-JÜRGEN·Filed 2011·Granted Oct 7, 2014·2 cites·20 claims
- 4973US11906904B2Projection exposure method and projection lens with setting of the pupil transmissionZEISS CARL SMT GMBH·Filed 2021·Granted Feb 20, 2024·0 cites·27 claims
- 5073US11156922B2Method and device for determining the heating state of a mirror in an optical systemZEISS CARL SMT GMBH·Filed 2020·Granted Oct 26, 2021·1 cites·20 claims
Showing the top 50 of 174 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →