Inventor · disambiguated record
Toshiaki Hongo
Also filed as: HONGO TOSHIAKI
6 granted patents·2 pending applications·92 citations·filing 2000–2009
82Inventor score
Top patents by PatentIndex Score
8 records- 0187US7629033B2Plasma processing method for forming a silicon nitride film on a silicon oxide filmTOKYO ELECTRON LTD·Filed 2007·Granted Dec 8, 2009·11 cites·3 claims
- 0286US6372084B2Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plateTOKYO ELECTRON LTD·Filed 2001·Granted Apr 16, 2002·42 cites·10 claims
- 0380US6656322B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Dec 2, 2003·17 cites·15 claims
- 0474US6729261B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted May 4, 2004·21 cites·14 claims
- 0551US2011114021A1Planar antenna member and plasma processing apparatus including the sameUEDA ATSUSHI·Filed 2009·Application pending·0 cites
- 0647US8092642B2Plasma processing apparatusHONGO TOSHIAKI·Filed 2009·Granted Jan 10, 2012·0 cites·7 claims
- 0744US6428661B1Plating apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 6, 2002·1 cites·10 claims
- 0837US2002002948A1Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamberFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →