Inventor · disambiguated record
Toshiaki Hongoh
Also filed as: HONGOH TOSHIAKI
15 granted patents·3 pending applications·888 citations·filing 1991–2005
95Inventor score
Files withTOKYO ELECTRON LTD17
Top patents by PatentIndex Score
18 records- 0196US6399520B1Semiconductor manufacturing method and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 4, 2002·175 cites·13 claims
- 0294US5525159APlasma process apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jun 11, 1996·194 cites·22 claims
- 0393US5716451APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Feb 10, 1998·116 cites·21 claims
- 0491US6325018B1Flat antenna having openings provided with conductive materials accommodated therein and plasma processing apparatus using the flat antennaTOKYO ELECTRON LTD·Filed 2000·Granted Dec 4, 2001·42 cites·19 claims
- 0590US5792261APlasma process apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 11, 1998·94 cites·16 claims
- 0688US6358324B1Microwave plasma processing apparatus having a vacuum pump located under a susceptorTOKYO ELECTRON LTD·Filed 2000·Granted Mar 19, 2002·31 cites·12 claims
- 0788US6343565B1Flat antenna having rounded slot openings and plasma processing apparatus using the flat antennaTOKYO ELECTRON LTD·Filed 2000·Granted Feb 5, 2002·31 cites·14 claims
- 0885US5179498AElectrostatic chuck deviceTOKYO ELECTRON LTD·Filed 1991·Granted Jan 12, 1993·97 cites·6 claims
- 0984US7018506B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Mar 28, 2006·20 cites·9 claims
- 1083US6470824B2Semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Oct 29, 2002·26 cites·3 claims
- 1178US6797111B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Sep 28, 2004·17 cites·9 claims
- 1278US6736930B1Microwave plasma processing apparatus for controlling a temperature of a wavelength reducing memberTOKYO ELECTRON LTD·Filed 2000·Granted May 18, 2004·23 cites·17 claims
- 1372USRE39020EPlasma process apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Mar 21, 2006·12 cites·106 claims
- 1470US6675737B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 13, 2004·10 cites·9 claims
- 1541US7569497B2Method and apparatus for forming insulating layerTOKYO ELECTRON LTD·Filed 2005·Granted Aug 4, 2009·0 cites·12 claims
- 1639US2004011465A1Plasma Processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 1739US2004011466A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 1837US2003148623A1Plasma processing deviceFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →