Inventor · disambiguated record
Toshifumi Ishida
Also filed as: ISHIDA TOSHIFUMI
11 granted patents·7 pending applications·20 citations·filing 2004–2024
83Inventor score
Files withTOKYO ELECTRON LTD10ISHIDA TOSHIFUMI3NUVOTON TECHNOLOGY CORP JAPAN3HAYASHI DAISUKE1PANASONIC IP MAN CO LTD1
Top patents by PatentIndex Score
18 records- 0189US9082593B2Electrode having gas discharge function and plasma processing apparatusHAYASHI DAISUKE·Filed 2012·Granted Jul 14, 2015·11 cites·19 claims
- 0278US8319141B2Cooling block forming electrodeISHIDA TOSHIFUMI·Filed 2010·Granted Nov 27, 2012·4 cites·5 claims
- 0368USD986840SSemiconductor deviceNUVOTON TECHNOLOGY CORP JAPAN·Filed 2020·Granted May 23, 2023·4 cites·1 claims
- 0466US9210791B2Cooling block forming electrodeTOKYO ELECTRON LTD·Filed 2012·Granted Dec 8, 2015·1 cites·16 claims
- 0565US2022367154A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0663US12165958B2Power storage pack, semiconductor device, and semiconductor device manufacturing methodNUVOTON TECHNOLOGY CORP JAPAN·Filed 2024·Granted Dec 10, 2024·0 cites·18 claims
- 0755US11887822B2Edge ring and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 30, 2024·0 cites·6 claims
- 0855US11585860B2Semiconductor deviceNUVOTON TECHNOLOGY CORP JAPAN·Filed 2021·Granted Feb 21, 2023·0 cites·19 claims
- 0955US11538669B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 27, 2022·0 cites·20 claims
- 1050US2018374687A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1146US2007210037A1Cooling block forming electrodeISHIDA TOSHIFUMI·Filed 2007·Application pending·0 cites
- 1245US2015187542A1Substrate processing apparatus, shutter device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1342US9177839B2Cover part, process gas diffusing and supplying unit, and substrate processing apparatusISHIDA TOSHIFUMI·Filed 2009·Granted Nov 3, 2015·0 cites·9 claims
- 1441US10630186B2Switching power supply device and semiconductor devicePANASONIC IP MAN CO LTD·Filed 2019·Granted Apr 21, 2020·0 cites·11 claims
- 1540US9484213B2Processing gas diffusing and supplying unit and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Nov 1, 2016·0 cites·20 claims
- 1639US2021335584A1Stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1736US2005000442A1Upper electrode and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1834US2010240154A1Temperature control device, temperature control method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →