Inventor · disambiguated record
Toshihiko Iwao
Also filed as: IWAO TOSHIHIKO
23 granted patents·16 pending applications·39 citations·filing 2011–2024
92Inventor score
Top patents by PatentIndex Score
39 records- 0196US10145014B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 4, 2018·17 cites·11 claims
- 0285US11605536B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2020·Granted Mar 14, 2023·1 cites·20 claims
- 0385US10991549B2Antenna and plasma deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·4 cites·11 claims
- 0485US10370763B2Plasma processing apparatusHIRANO TAKAHIRO·Filed 2016·Granted Aug 6, 2019·2 cites·14 claims
- 0582US11139147B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 5, 2021·1 cites·17 claims
- 0682US10546725B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jan 28, 2020·3 cites·9 claims
- 0782US9305751B2Microwave plasma processing apparatus and microwave supplying methodTOKYO ELECTRON LTD·Filed 2014·Granted Apr 5, 2016·4 cites·5 claims
- 0881US2023399739A1Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0980US2025095983A1Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1079US12176204B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 1176US11773484B2Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2021·Granted Oct 3, 2023·0 cites·20 claims
- 1270US10804077B2Microwave plasma source, microwave plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 13, 2020·1 cites·14 claims
- 1367US9831067B2Film-forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Nov 28, 2017·2 cites·13 claims
- 1467US2025270697A1Bottom-up directional atomic layer deposition (ald)TOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1566US12387919B2ALD process with plasma treatmentTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·14 claims
- 1666US10513777B2Film formation deviceTOKYO ELECTRON LTD·Filed 2013·Granted Dec 24, 2019·2 cites·7 claims
- 1762US2025259819A1Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1861US9111727B2Plasma tuning rods in microwave resonator plasma sourcesZHAO JIANPING·Filed 2011·Granted Aug 18, 2015·1 cites·7 claims
- 1961US2025308886A1Gap filling by atomic layer deposition (ald)TOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2060US12300466B2Plasma enhanced film formation methodTOKYO ELECTRON LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 2160US2025299967A1Method of manufacturing semiconductor device and semiconductor devices produced by such methodsSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2258US9793095B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Oct 17, 2017·0 cites·11 claims
- 2357US9947515B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Apr 17, 2018·0 cites·20 claims
- 2457US8808496B2Plasma tuning rods in microwave processing systemsZHAO JIANPING·Filed 2011·Granted Aug 19, 2014·1 cites·14 claims
- 2553US9633821B2Microwave plasma processing apparatus and microwave supplying methodTOKYO ELECTRON LTD·Filed 2016·Granted Apr 25, 2017·0 cites·6 claims
- 2650US2023295797A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2748US11996268B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted May 28, 2024·0 cites·7 claims
- 2846US9875882B2Microwave plasma processing apparatus, slot antenna, and semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Granted Jan 23, 2018·0 cites·7 claims
- 2946US2015013907A1Microwave plasma processing apparatus, slot antenna, and semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3046US2015013912A1Microwave plasma processing apparatus, slot antenna, and semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3146US2014251541A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3246US2015013913A1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3345US2023017876A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3444US2015194290A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3543US10570512B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 25, 2020·0 cites·21 claims
- 3642US10347466B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jul 9, 2019·0 cites·10 claims
- 3741US2013084706A1Plasma-Tuning Rods in Surface Wave Antenna (SWA) SourcesZHAO JIANPING·Filed 2011·Application pending·0 cites
- 3835US2017350014A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3935US2017342564A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →