Inventor · disambiguated record
Toshiyuki Kawaharamura
Also filed as: KAWAHARAMURA TOSHIYUKI
7 granted patents·5 pending applications·2 citations·filing 2009–2023
70Inventor score
Files withTOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP3DENSO CORP2SHINETSU CHEMICAL CO2TOSHIBA MITSUBISHI ELEC INC2NOF CORP1
Top patents by PatentIndex Score
12 records- 0178US9279182B2Apparatus for forming metal oxide film, method for forming metal oxide film, and metal oxide filmSHIRAHATA TAKAHIRO·Filed 2010·Granted Mar 8, 2016·2 cites·7 claims
- 0260US12191150B2Switching device and method for manufacturing the sameDENSO CORP·Filed 2022·Granted Jan 7, 2025·0 cites·5 claims
- 0359US12283619B2Nitride semiconductor device and method of manufacturing the sameDENSO CORP·Filed 2022·Granted Apr 22, 2025·0 cites·11 claims
- 0457US2016047049A1Apparatus for forming metal oxide film, method for forming metal oxide film, and metal oxide filmTOSHIBA MITSUBISHI ELEC INC·Filed 2015·Application pending·0 cites
- 0554US9954135B2Solar cell manufacturing methodTOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP·Filed 2013·Granted Apr 24, 2018·0 cites·1 claims
- 0652US2016047037A1Film formation methodTOSHIBA MITSUBISHI ELEC INC·Filed 2013·Application pending·0 cites
- 0750US2025185151A1Heat dissipation substrate, heat dissipation circuit board, heat dissipation member, and method for manufacturing heat dissipation substrateNOF CORP·Filed 2023·Application pending·0 cites
- 0848US9574271B2Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide filmORITA HIROYUKI·Filed 2009·Granted Feb 21, 2017·0 cites·12 claims
- 0945US2022411926A1Atomizing apparatus for film formation, film forming apparatus using the same, and semiconductor filmSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1043US2023253203A1Method for producing doping raw-material solution for film formation, method for producing laminate, doping raw-material solution for film formation, and semiconductor filmSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1142US10290762B2Metal oxide film formation methodTOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP·Filed 2015·Granted May 14, 2019·0 cites·3 claims
- 1235US11555245B2Metal oxide film formation methodTOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP·Filed 2015·Granted Jan 17, 2023·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →