Inventor · disambiguated record
Tomoki Nagai
Also filed as: NAGAI TOMOKI
49 granted patents·17 pending applications·329 citations·filing 2001–2020
97Inventor score
Top patents by PatentIndex Score
66 records- 0196US7812105B2Compound, polymer, and radiation-sensitive compositionJSR CORP·Filed 2006·Granted Oct 12, 2010·25 cites·19 claims
- 0295US6908722B2Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Jun 21, 2005·200 cites·21 claims
- 0394US7897821B2Sulfonium compoundJSR CORP·Filed 2010·Granted Mar 1, 2011·15 cites·1 claims
- 0491US11426761B2Modification method of surface of base, composition, and polymerJSR CORP·Filed 2020·Granted Aug 30, 2022·2 cites·18 claims
- 0589US7956142B2Polymerizable sulfonic acid onium salt and resinJSR CORP·Filed 2007·Granted Jun 7, 2011·9 cites·4 claims
- 0684US10018911B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Jul 10, 2018·4 cites·15 claims
- 0784US9587065B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 7, 2017·2 cites·19 claims
- 0881US8211624B2Method for pattern formation and resin composition for use in the methodNAKAMURA ATSUSHI·Filed 2008·Granted Jul 3, 2012·6 cites·19 claims
- 0981US6933094B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Aug 23, 2005·17 cites·5 claims
- 1079US10073349B2Chemically amplified resist material, pattern-forming method, compound, and production method of compoundUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·2 cites·19 claims
- 1179US8968458B2Composition for resist underlayer film and process for producing sameKONNO KEIJI·Filed 2010·Granted Mar 3, 2015·5 cites·20 claims
- 1279US8808446B2Composition for resist underlayer film and process for producing sameKONNO KEIJI·Filed 2006·Granted Aug 19, 2014·7 cites·12 claims
- 1377US7202016B2Radiation-sensitive resin compositionJSR CORP·Filed 2005·Granted Apr 10, 2007·4 cites·17 claims
- 1473US9684235B2Directed self-assembling composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2014·Granted Jun 20, 2017·2 cites·16 claims
- 1571US10308752B2Block copolymerJSR CORP·Filed 2017·Granted Jun 4, 2019·1 cites·14 claims
- 1671US6821705B2Radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Nov 23, 2004·11 cites·13 claims
- 1770US8440384B2Compound, salt, and radiation-sensitive resin compositionEBATA TAKUMA·Filed 2010·Granted May 14, 2013·2 cites·10 claims
- 1869US9718950B2Directed self-assembly composition for pattern formation and pattern-forming methodJSR CORP·Filed 2013·Granted Aug 1, 2017·1 cites·18 claims
- 1967US7335457B2Positive-tone radiation-sensitive resin compositionJSR CORP·Filed 2005·Granted Feb 26, 2008·2 cites·23 claims
- 2066US9989849B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Jun 5, 2018·1 cites·20 claims
- 2165US8647810B2Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor deviceNAKAHARA KAZUO·Filed 2011·Granted Feb 11, 2014·1 cites·12 claims
- 2260US10995173B2Composition and pattern-forming methodJSR CORP·Filed 2019·Granted May 4, 2021·0 cites·20 claims
- 2359US11335559B2Pattern-forming method, and compositionJSR CORP·Filed 2020·Granted May 17, 2022·0 cites·24 claims
- 2458US11525067B2Modification method of substrate surface, and composition and polymerJSR CORP·Filed 2019·Granted Dec 13, 2022·0 cites·16 claims
- 2558US9557644B2Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·16 claims
- 2655US2014363773A1Pattern-forming methodJSR CORP·Filed 2014·Application pending·0 cites
- 2754US8273837B2Compound, polymer, and resin compositionNAGAI TOMOKI·Filed 2006·Granted Sep 25, 2012·1 cites·5 claims
- 2852US11884309B2Railcar air conditioning ductKAWASAKI RAILCAR MFG CO LTD·Filed 2019·Granted Jan 30, 2024·0 cites·14 claims
- 2952US10146130B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2017·Granted Dec 4, 2018·0 cites·10 claims
- 3052US2018342387A1Pattern-forming method, and compositionJSR CORP·Filed 2018·Application pending·0 cites
- 3152US2017088740A1Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2016·Application pending·0 cites
- 3251US2010323292A1Resist pattern formation method, and resin composition capable of insolubilizing resist patternJSR CORP·Filed 2008·Application pending·0 cites
- 3349US2012156621A1Radiation-sensitive resin compositionNAKAMURA ATSUSHI·Filed 2012·Application pending·0 cites
- 3447US9040221B2Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compoundOSAKI HITOSHI·Filed 2011·Granted May 26, 2015·0 cites·11 claims
- 3547US8722306B2Radiation-sensitive resin compositionSAKAKIBARA HIROKAZU·Filed 2008·Granted May 13, 2014·0 cites·7 claims
- 3647US2012244478A1Resist pattern formation methodNAKAMURA ATSUSHI·Filed 2012·Application pending·0 cites
- 3746US9690192B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2015·Granted Jun 27, 2017·0 cites·15 claims
- 3845US8026039B2Radiation-sensitive resin compositionJSR CORP·Filed 2007·Granted Sep 27, 2011·2 cites·1 claims
- 3945US2010009292A1Resin composition for micropattern formation and method of micropattern formationJSR CORP·Filed 2008·Application pending·0 cites
- 4044US11462405B2Pattern-forming method and patterned substrateJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·20 claims
- 4144US9738746B2Composition for pattern formation, pattern-forming method, and block copolymerJSR CORP·Filed 2016·Granted Aug 22, 2017·0 cites·20 claims
- 4244US7488566B2Positive type radiation-sensitive resin compositionJSR CORP·Filed 2006·Granted Feb 10, 2009·2 cites·23 claims
- 4344US2015093508A1Composition for pattern formation and pattern-forming methodJSR CORP·Filed 2014·Application pending·0 cites
- 4443US11204552B2Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agentJSR CORP·Filed 2018·Granted Dec 21, 2021·0 cites·17 claims
- 4542US9599892B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 21, 2017·0 cites·17 claims
- 4642US9534135B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Jan 3, 2017·0 cites·20 claims
- 4742US2020013617A1Substrate treatment method, substrate treatment system and directed self-assembling materialJSR CORP·Filed 2019·Application pending·0 cites
- 4842US2006166138A1Radiation-sensitive resin compositionJSR CORP·Filed 2006·Application pending·0 cites
- 4941US7258962B2Positive-tone radiation-sensitive resin compositionJSR CORP·Filed 2005·Granted Aug 21, 2007·0 cites·13 claims
- 5040US10120282B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Nov 6, 2018·0 cites·11 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →