Pattern-forming method

Abstract

A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R 1 represents a hydrogen atom or a methyl group, and each of R 2 s individually represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, a linear or branched alkyl group having 1 to 4 carbon atoms, or the like. Each of R 18 to R 20 individually represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group or a halogen atom, and Z − represents OH − , R—COO − , R—SO 3 − or an anion shown by a following formula (10), wherein R represents an alkyl group, an aryl group or an alkaryl group.

1 - 5 . (canceled) 
     
     
         6 . A pattern-forming method comprising:
 providing a radiation-sensitive resin composition on a substrate to provide a resist film on the substrate;   applying an ArF excimer laser onto the resist film to expose the resist film; and   developing the exposed resist film,   the radiation-sensitive resin composition comprising:
 a resin including a repeating unit shown by a formula (1); 
 a photoacid generator; and 
 a photodisintegrating base shown by a formula (8), 
   
       
         
           
           
               
               
           
         
         wherein 
         R 1  represents a hydrogen atom or a methyl group; and 
         each R 2  individually represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, wherein at least one of the R 2 s is a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof; or 
         two of the R 2 s form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom to which each R 2  bonds, the remaining R 2  being a linear or branched alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, 
       
       
         
           
           
               
               
           
         
         wherein 
         each of R 18  to R 20  individually represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group or a halogen atom; and 
         Z −  represents OH − , R—COO − , R—SO 3   −  or an anion shown by a formula (10), wherein R represents an alkyl group, an aryl group or an alkaryl group, 
       
       
         
           
           
               
               
           
         
       
     
     
         7 . The pattern-forming method according to  claim 6 , wherein the photodisintegrating base is a triphenylsulfonium salt compound. 
     
     
         8 . The pattern-forming method according to  claim 7 , wherein the photodisintegrating base is triphenylsulfonium salicylate or triphenylsulfonium 10-camphorsulfonate. 
     
     
         9 . The pattern-forming method-according to  claim 6 , wherein the group shown by formula —C(R 2 ) 3  in the formula (1) is any one of groups shown by formulas (1a) to (1f), 
       
         
           
           
               
               
           
         
         wherein R 12  individually represents a linear or branched alkyl group having 1 to 4 carbon atoms, and m is 0 or 1. 
       
     
     
         10 . The pattern-forming method according to  claim 6 , wherein the photoacid generator has a structure shown by a formula (6), 
       
         
           
           
               
               
           
         
         wherein 
         R 15  represents a hydrogen atom, a fluorine atom, a hydroxyl group, a linear or branched alkyl group having 1 to 10 carbon atoms, a linear or branched alkoxy group having 1 to 10 carbon atoms, or a linear or branched alkoxycarbonyl group having 2 to 11 carbon atoms; 
         R 13  represents a linear or branched alkyl group having 1 to 10 carbon atoms, a linear or branched alkoxy group having 1 to 10 carbon atoms, or a linear, branched or cyclic alkanesulfonyl group having 1 to 10 carbon atoms; 
         each R 14  individually represents a linear or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted phenyl group, or a substituted or unsubstituted naphthyl group, or two R 14 s bond to form a divalent group having 2 to 10 carbon atoms; 
         k represents an integer of 0 to 2; 
         X −  indicates an anion of a general formula R 16 C n F 2n SO 3   − , wherein R 16  is a fluorine atom, or a substituted or unsubstituted hydrocarbon group having 1 to 12 carbon atoms; and 
         q represents an integer of 0 to 10.