Inventor · disambiguated record
Tomohiko Niizeki
Also filed as: NIIZEKI TOMOHIKO
4 granted patents·7 pending applications·5 citations·filing 2012–2024
62Inventor score
Top patents by PatentIndex Score
11 records- 0182US12112954B2Etching method, substrate processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Oct 8, 2024·1 cites·20 claims
- 0275US8872291B2Ferromagnetic tunnel junction structure and magnetoresistive effect device and spintronics device utilizing sameNAT INST FOR MATERIALS SCIENCE·Filed 2012·Granted Oct 28, 2014·4 cites·6 claims
- 0373US2025022706A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0467US2024211753A1Adjusting method and adjusting devicePREFERRED NETWORKS INC·Filed 2024·Application pending·0 cites
- 0561US11922307B2Learning device, inference device, and learned modelPREFERRED NETWORKS INC·Filed 2021·Granted Mar 5, 2024·0 cites·20 claims
- 0658US2021202233A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 0754US2025046603A1Atomic Layer Deposition of Passivation LayerTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0853US2023245898A1Plasma processing method and plasma processing systemTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0952US11637003B2Method for etching film and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·19 claims
- 1051US2024112919A1Low-Temperature EtchTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1141US2020279753A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →