Inventor · disambiguated record
Tokuhisa Oiwa
Also filed as: OIWA TOKUHISA
1 granted patent·2 pending applications·2 citations·filing 2018–2022
20Inventor score
Files withTOKYO ELECTRON LTD3
Top patents by PatentIndex Score
3 records- 0186US12315704B2Plasma processing apparatus, and method and program for controlling elevation of focus ringTOKYO ELECTRON LTD·Filed 2022·Granted May 27, 2025·2 cites·18 claims
- 0244US2019108986A1Plasma processing apparatus, and method and program for controlling elevation of focus ringTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 0334US2019318918A1Plasma processing apparatus, plasma control method, and computer storage mediumTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →