Inventor · disambiguated record
Toshiya Okamura
Also filed as: OKAMURA TOSHIYA
7 granted patents·2 pending applications·3 citations·filing 2014–2021
70Inventor score
Top patents by PatentIndex Score
9 records- 0172US9793109B2Perhydropolysilazane, composition containing same, and method for forming silica film using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Oct 17, 2017·3 cites·12 claims
- 0265US11866554B2Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the sameMERCK PATENT GMBH·Filed 2021·Granted Jan 9, 2024·0 cites·15 claims
- 0363US11999827B2Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the sameMERCK PATENT GMBH·Filed 2021·Granted Jun 4, 2024·0 cites·14 claims
- 0454US11059995B2Film forming compositionMERCK PATENT GMBH·Filed 2018·Granted Jul 13, 2021·0 cites·20 claims
- 0548US11059974B2Silicon carbonaceous film forming composition comprising polycarbosilane and method for manufacturing silicon carbonaceous film using the sameMERCK PATENT GMBH·Filed 2018·Granted Jul 13, 2021·0 cites·17 claims
- 0644US2023374226A1Polysilazane, siliceous film-forming composition comprising the same, and method for producing siliceous film using the sameMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 0743US2023312978A1Polysilazane, siliceous film-forming composition comprising the same, and method for producing siliceous film using the sameMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 0842US10913852B2Siloxazane compound and composition comprising the same, and method for producing silceous film using the sameRIDGEFIELD ACQUISITION·Filed 2017·Granted Feb 9, 2021·0 cites·17 claims
- 0938US12441822B2Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor compositionMERCK PATENT GMBH·Filed 2020·Granted Oct 14, 2025·0 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Toshiya Okamura files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →