Inventor · disambiguated record
Tomoya Onitsuka
Also filed as: ONITSUKA TOMOYA
2 granted patents·7 pending applications·2 citations·filing 2017–2025
36Inventor score
Files withTOKYO ELECTRON LTD9
Top patents by PatentIndex Score
9 records- 0177US10656526B2Substrate treatment method and thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2017·Granted May 19, 2020·2 cites·10 claims
- 0263US2024355644A1Substrate processing system, substrate processing apparatus, and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0361US12298668B2Heat treatment apparatus and heat treatment methodTOKYO ELECTRON LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 0460US2025201586A1Substrate processing system, substrate processing apparatus, and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0556US2024347354A1Heat-treating method, heat-treating apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0653US2024120217A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0751US2024027923A1Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0850US2025223694A1Substrate processing apparatus, substrate processing method, and filterTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0943US2024038533A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →