Inventor · disambiguated record
Toru Otsubo
Also filed as: OTSUBO TORU
25 granted patents·7 pending applications·3,160 citations·filing 1982–2006
98Inventor score
Top patents by PatentIndex Score
32 records- 0199US6197151B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2000·Granted Mar 6, 2001·223 cites·5 claims
- 0298US6158383APlasma processing method and apparatusHITACHI LTD·Filed 1999·Granted Dec 12, 2000·339 cites·8 claims
- 0398US5134965AProcessing apparatus and method for plasma processingHITACHI LTD·Filed 1990·Granted Aug 4, 1992·866 cites·21 claims
- 0497US5275977AInsulating film forming method for semiconductor device interconnectionHITACHI LTD·Filed 1991·Granted Jan 4, 1994·343 cites·14 claims
- 0596US6245190B1Plasma processing system and plasma processing methodHITACHI LTD·Filed 1998·Granted Jun 12, 2001·194 cites·10 claims
- 0695US6129806APlasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1997·Granted Oct 10, 2000·92 cites·12 claims
- 0795US4622094AMethod of controlling dry etching by applying an AC voltage to the workpieceHITACHI LTD·Filed 1984·Granted Nov 11, 1986·112 cites·18 claims
- 0894US4615620AApparatus for measuring the depth of fine engraved patternsHITACHI LTD·Filed 1984·Granted Oct 7, 1986·56 cites·13 claims
- 0993US4985109AApparatus for plasma processingHITACHI LTD·Filed 1990·Granted Jan 15, 1991·99 cites·49 claims
- 1092US4808258APlasma processing method and apparatus for carrying out the sameHITACHI LTD·Filed 1984·Granted Feb 28, 1989·98 cites·30 claims
- 1192US4776918APlasma processing apparatusHITACHI LTD·Filed 1987·Granted Oct 11, 1988·113 cites·12 claims
- 1290US6422172B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1998·Granted Jul 23, 2002·100 cites·11 claims
- 1389US5531862AMethod of and apparatus for removing foreign particlesHITACHI LTD·Filed 1994·Granted Jul 2, 1996·125 cites·23 claims
- 1488US6902683B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2000·Granted Jun 7, 2005·29 cites·2 claims
- 1588US5759424APlasma processing apparatus and processing methodHITACHI LTD·Filed 1995·Granted Jun 2, 1998·114 cites·14 claims
- 1686US5304277APlasma processing apparatus using plasma produced by microwavesHITACHI LTD·Filed 1991·Granted Apr 19, 1994·47 cites·9 claims
- 1785US4479848AEtching method and apparatusHITACHI LTD·Filed 1984·Granted Oct 30, 1984·58 cites·14 claims
- 1880US4744660AApparatus for measuring difference in shallow levelHITACHI LTD·Filed 1986·Granted May 17, 1988·36 cites·17 claims
- 1978US6537832B2Measuring apparatus and film formation methodHITACHI LTD·Filed 2001·Granted Mar 25, 2003·18 cites·18 claims
- 2077US6750977B2Apparatus for monitoring thickness of deposited layer in reactor and dry processing methodHITACHI LTD·Filed 2001·Granted Jun 15, 2004·16 cites·8 claims
- 2175US4420233AProjecting apparatusHITACHI LTD·Filed 1982·Granted Dec 13, 1983·26 cites·16 claims
- 2267US4487678ADry-etching apparatusHITACHI LTD·Filed 1984·Granted Dec 11, 1984·28 cites·2 claims
- 2365US4840487AMeasuring apparatus for etching pitsHITACHI LTD·Filed 1986·Granted Jun 20, 1989·13 cites·10 claims
- 2459US5762814APlasma processing method and apparatus using plasma produced by microwavesHITACHI LTD·Filed 1994·Granted Jun 9, 1998·12 cites·11 claims
- 2553US2006144518A1Plasma processing apparatus and plasma processing methodKAJI TETSUNORI·Filed 2006·Application pending·0 cites
- 2648US6797529B2Processing apparatus with measuring unit and methodHITACHI LTD·Filed 2003·Granted Sep 28, 2004·3 cites·21 claims
- 2746US2005082006A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 2845US2004178180A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 2945US2001037770A1Plasma processing apparatus and processing methodFiled 2001·Application pending·0 cites
- 3044US2004037971A1Plasma processing apparatus and processing methodFiled 2003·Application pending·0 cites
- 3142US2002069971A1Plasma processing apparatus and plasma processing methodFiled 2002·Application pending·0 cites
- 3237US2003010453A1Plasma processing apparatus and plasma processing methodFiled 2002·Application pending·0 cites
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