Inventor · disambiguated record
Toshihisa Ozu
Also filed as: OZU TOSHIHISA
11 granted patents·11 pending applications·14 citations·filing 2001–2025
83Inventor score
Files withTOKYO ELECTRON LTD12MITSUBISHI ELECTRIC CORP4OZU TOSHIHISA2KINTAKA HIROKI1NISHIZUKA TETSUYA1
Top patents by PatentIndex Score
22 records- 0179US9337020B2Resist mask processing method using hydrogen containing plasmaTOKYO ELECTRON LTD·Filed 2013·Granted May 10, 2016·6 cites·15 claims
- 0270US8753527B2Plasma etching method and plasma etching apparatusNISHIZUKA TETSUYA·Filed 2009·Granted Jun 17, 2014·3 cites·11 claims
- 0369US8835320B2Etching method and deviceOZU TOSHIHISA·Filed 2011·Granted Sep 16, 2014·3 cites·15 claims
- 0465US8980048B2Plasma etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Mar 17, 2015·1 cites·5 claims
- 0564US2025149316A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0664US2025149315A1Adjustment method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0760US8771537B2Plasma treatment device and plasma treatment methodOZU TOSHIHISA·Filed 2010·Granted Jul 8, 2014·1 cites·4 claims
- 0858US2024030014A1Seasoning method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0958US2024030012A1Detection method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1052US10224220B2Plasma processing apparatus and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Mar 5, 2019·0 cites·5 claims
- 1152US2025166980A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1247US2005259669A1Media gateway deviceMITSUBISHI ELECTRIC CORP·Filed 2004·Application pending·0 cites
- 1346US9034698B2Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2014·Granted May 19, 2015·0 cites·7 claims
- 1444US7499461B2Gateway apparatusMITSUBISHI ELECTRIC CORP·Filed 2004·Granted Mar 3, 2009·0 cites·2 claims
- 1542US2004160948A1IP network communication apparatusMITSUBISHI ELECTRIC CORP·Filed 2003·Application pending·0 cites
- 1641US9728417B2Method for processing base body to be processedTOKYO ELECTRON LTD·Filed 2012·Granted Aug 8, 2017·0 cites·8 claims
- 1741US2003147473A1Digital signal transmitting device for switching a signal processor of a fault condition for a spare signal processor of a non-fault conditionMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 1840US2015096882A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1938US8969210B2Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing methodNOZAWA TOSHIHISA·Filed 2011·Granted Mar 3, 2015·0 cites·6 claims
- 2037US2013071955A1Plasma etching methodKINTAKA HIROKI·Filed 2011·Application pending·0 cites
- 2136US2003154303A1Digital circuit multiplexing deviceFiled 2001·Application pending·0 cites
- 2229US9711371B2Method of etching organic filmTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →