Inventor · disambiguated record
Tomoyuki Sakoda
Also filed as: SAKODA TOMOYUKI
8 granted patents·4 pending applications·460 citations·filing 1999–2007
89Inventor score
Top patents by PatentIndex Score
12 records- 0196US6485988B2Hydrogen-free contact etch for ferroelectric capacitor formationTEXAS INSTRUMENTS INC·Filed 2000·Granted Nov 26, 2002·191 cites·8 claims
- 0295US6548343B1Method of fabricating a ferroelectric memory cellAGILENT TECHNOLOGIES INC·Filed 2000·Granted Apr 15, 2003·152 cites·21 claims
- 0393US6713342B2FeRAM sidewall diffusion barrier etchTEXAS INSTRUMENTS INC·Filed 2002·Granted Mar 30, 2004·78 cites·25 claims
- 0482US7674710B2Method of integrating metal-containing films into semiconductor devicesTOKYO ELECTRON LTD·Filed 2006·Granted Mar 9, 2010·10 cites·29 claims
- 0552US6303952B1Contact structure with an oxide silicidation barrierTEXAS INSTRUMENTS INC·Filed 1999·Granted Oct 16, 2001·17 cites·8 claims
- 0650US6275408B1Ferroelectric memory and methodTEXAS INSTRUMENTS INC·Filed 2000·Granted Aug 14, 2001·6 cites·7 claims
- 0748US7629183B2Method for manufacturing semiconductor device and computer storage mediumTOKYO ELECTRON LTD·Filed 2006·Granted Dec 8, 2009·0 cites·16 claims
- 0842US2007022954A1Gas treatment device and heat readiting methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 0942US2009038548A1Substrate treating apparatus and treating gas emitting mechanismTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1040US2008171142A1Film Deposition Method And Film Deposition SystemMATSUMOTO KENJI·Filed 2006·Application pending·0 cites
- 1137US6238932B1Method for fabricating reliable multilayer bottom electrode for ferroelectric capacitorsTEXAS INSTRUMENTS INC·Filed 1999·Granted May 29, 2001·6 cites·2 claims
- 1234US2003176073A1Plasma etching of Ir and PZT using a hard mask and C12/N2/O2 and C12/CHF3/O2 chemistryFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →