Inventor · disambiguated record
Toshiyuki Shigetomi
Also filed as: SHIGETOMI Toshiyuki
17 granted patents·3 pending applications·2 citations·filing 2012–2024
85Inventor score
Top patents by PatentIndex Score
20 records- 0174US9266916B2Production method for dodecacarbonyl trirutheniumTANAKA PRECIOUS METAL IND·Filed 2014·Granted Feb 23, 2016·1 cites·8 claims
- 0266US2025051909A1A chemical vapor deposition method using an organomanganese compound as a starting materialTANAKA KIKNZOKU KOGYO K K·Filed 2024·Application pending·0 cites
- 0364US10526698B2Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2019·Granted Jan 7, 2020·0 cites·2 claims
- 0464US10407450B2Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin filmsTANAKA PRECIOUS METAL IND·Filed 2016·Granted Sep 10, 2019·1 cites·20 claims
- 0558US11084837B2Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2018·Granted Aug 10, 2021·0 cites·7 claims
- 0658US9382616B2Chemical vapor deposition raw material comprising organoplatinum compound, and chemical vapor deposition method using the chemical vapor deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2012·Granted Jul 5, 2016·0 cites·4 claims
- 0756US12152300B2Chemical vapor deposition method using an organomanganese compound as a starting materialTANAKA PRECIOUS METAL IND·Filed 2020·Granted Nov 26, 2024·0 cites·5 claims
- 0856US10533027B2Method for producing cyclometalated iridium complexTANAKA PRECIOUS METAL IND·Filed 2016·Granted Jan 14, 2020·0 cites·19 claims
- 0951US2018119274A1Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2016·Application pending·0 cites
- 1050US11434563B2Raw material for chemical deposition containing ruthenium complex, and chemical deposition method using the raw material for chemical depositionTANAKA PRECIOUS METAL IND·Filed 2019·Granted Sep 6, 2022·0 cites·8 claims
- 1149US10053479B2Raw material and production method for cyclometalated iridium complexTANAKA PRECIOUS METAL IND·Filed 2014·Granted Aug 21, 2018·0 cites·6 claims
- 1247US9284249B2Method for extracting asymmetric β-diketone compound from β-diketone compoundTANAKA PRECIOUS METAL IND·Filed 2013·Granted Mar 15, 2016·0 cites·7 claims
- 1345US11149045B2Raw material for vapor deposition including organoplatinum compound and vapor deposition method using the raw material for vapor depositionTANAKA PRECIOUS METAL IND·Filed 2018·Granted Oct 19, 2021·0 cites·11 claims
- 1445US9108997B2Method for recycling organic ruthenium compound for chemical vapor depositionTANAKA PRECIOUS METAL IND·Filed 2013·Granted Aug 18, 2015·0 cites·19 claims
- 1543US10125158B2Method for manufacturing iridium complexTANAKA PRECIOUS METAL IND·Filed 2015·Granted Nov 13, 2018·0 cites·7 claims
- 1641US10465283B2Organoplatinum compound for use in the chemical deposition of platinum compound thin filmsTANAKA PRECIOUS METAL IND·Filed 2016·Granted Nov 5, 2019·0 cites·11 claims
- 1741US10077282B2Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical depositionTANAKA PRECIOUS METAL IND·Filed 2016·Granted Sep 18, 2018·0 cites·20 claims
- 1837US10131987B2Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical depositionTANAKA PRECIOUS METAL IND·Filed 2015·Granted Nov 20, 2018·0 cites·2 claims
- 1936US10815260B2Chemical vapor deposition raw material including dinuclear ruthenium complex and chemical deposition method using chemical vapor deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2016·Granted Oct 27, 2020·0 cites·17 claims
- 2031US2018258526A1Chemical vapor deposition raw material including organoruthenium compound and chemical deposition method using the chemical vapor deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →