Inventor · disambiguated record
Toshikatsu Tobana
Also filed as: TOBANA TOSHIKATSU
8 granted patents·3 pending applications·6 citations·filing 2012–2021
74Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0187US11251048B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 0274US10069443B2Dechuck control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Sep 4, 2018·4 cites·18 claims
- 0355US11081351B2Method of processing substrate, device manufacturing method, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 3, 2021·0 cites·17 claims
- 0449US11062882B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Jul 13, 2021·0 cites·6 claims
- 0546US11594398B2Apparatus and method for plasma processingTOKYO ELECTRON LTD·Filed 2020·Granted Feb 28, 2023·0 cites·12 claims
- 0646US10867778B2Cleaning method and processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 15, 2020·0 cites·9 claims
- 0745US11569094B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 31, 2023·0 cites·19 claims
- 0844US2020194238A1Structure for substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 0942US2016203998A1Etching methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1040US2019237305A1Method for applying dc voltage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1132US9911621B2Method for processing target objectTOKYO ELECTRON LTD·Filed 2015·Granted Mar 6, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →