Inventor · disambiguated record
Tony Quan Tran
Also filed as: TRAN TONY QUAN
13 granted patents·1 pending application·24 citations·filing 2001–2021
83Inventor score
Top patents by PatentIndex Score
14 records- 0179US6602112B2Dissolution of metal particles produced by polishingRODEL INC·Filed 2001·Granted Aug 5, 2003·22 cites·15 claims
- 0272US9630293B2Chemical mechanical polishing pad composite polishing layer formulationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Apr 25, 2017·2 cites·11 claims
- 0365US11591495B2Neutral to alkaline chemical mechanical polishing compositions and methods for tungstenROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Feb 28, 2023·0 cites·8 claims
- 0457US2020381258A1Biased pulse cmp groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2020·Application pending·0 cites
- 0553US10995238B2Neutral to alkaline chemical mechanical polishing compositions and methods for tungstenROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted May 4, 2021·0 cites·3 claims
- 0651US10777418B2Biased pulse CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Sep 15, 2020·0 cites·10 claims
- 0742US10092998B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 9, 2018·0 cites·10 claims
- 0840US10011002B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jul 3, 2018·0 cites·10 claims
- 0939US9776300B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 3, 2017·0 cites·10 claims
- 1037US10857647B2High-rate CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
- 1137US10586708B2Uniform CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·10 claims
- 1237US9586305B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Mar 7, 2017·0 cites·9 claims
- 1336US10857648B2Trapezoidal CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·12 claims
- 1436US10861702B2Controlled residence CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
Join the waitlist — get patent alerts
Get an alert when Tony Quan Tran files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →