Inventor · disambiguated record
Toan Q. Tran
Also filed as: TRAN TOAN · TRAN TOAN Q
31 granted patents·12 pending applications·1,276 citations·filing 1999–2024
97Inventor score
Top patents by PatentIndex Score
43 records- 0198US10354843B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·40 cites·20 claims
- 0298US9978564B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·106 cites·13 claims
- 0398US9728437B2High temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·123 cites·14 claims
- 0498US9132436B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2013·Granted Sep 15, 2015·198 cites·19 claims
- 0597US7989365B2Remote plasma source seasoningAPPLIED MATERIALS INC·Filed 2009·Granted Aug 2, 2011·621 cites·23 claims
- 0696US11728139B2Process chamber for cyclic and selective material removal and etchingAPPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·3 cites·18 claims
- 0796US8894767B2Flow control features of CVD chambersCHUC KIEN N·Filed 2010·Granted Nov 25, 2014·107 cites·16 claims
- 0894US10755900B2Multi-layer plasma erosion protection for chamber componentsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 25, 2020·7 cites·18 claims
- 0993US11594428B2Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2017·Granted Feb 28, 2023·9 cites·16 claims
- 1090US11972930B2Cylindrical cavity with impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2021·Granted Apr 30, 2024·1 cites·20 claims
- 1189US11361941B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·2 cites·17 claims
- 1287US12288675B2Cylindrical cavity with impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2024·Granted Apr 29, 2025·0 cites·13 claims
- 1387US10340124B2Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2016·Granted Jul 2, 2019·3 cites·19 claims
- 1486US11195699B2Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguideAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·2 cites·18 claims
- 1586US10550472B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2014·Granted Feb 4, 2020·2 cites·4 claims
- 1684US9018108B2Low shrinkage dielectric filmsAPPLIED MATERIALS INC·Filed 2013·Granted Apr 28, 2015·6 cites·20 claims
- 1782US10504700B2Plasma etching systems and methods with secondary plasma injectionAPPLIED MATERIALS INC·Filed 2015·Granted Dec 10, 2019·3 cites·20 claims
- 1880US10559451B2Apparatus with concentric pumping for multiple pressure regimesAPPLIED MATERIALS INC·Filed 2017·Granted Feb 11, 2020·3 cites·19 claims
- 1978US11004661B2Process chamber for cyclic and selective material removal and etchingAPPLIED MATERIALS INC·Filed 2016·Granted May 11, 2021·2 cites·23 claims
- 2077US12009228B2Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2023·Granted Jun 11, 2024·0 cites·19 claims
- 2176US7204888B2Lift pin assembly for substrate processingAPPLIED MATERIALS INC·Filed 2003·Granted Apr 17, 2007·22 cites·21 claims
- 2275US10903052B2Systems and methods for radial and azimuthal control of plasma uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Jan 26, 2021·1 cites·18 claims
- 2374US7806383B2Slit valveAPPLIED MATERIALS INC·Filed 2007·Granted Oct 5, 2010·6 cites·16 claims
- 2470US12146219B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 19, 2024·0 cites·21 claims
- 2570US10431429B2Systems and methods for radial and azimuthal control of plasma uniformityAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·1 cites·20 claims
- 2665US12431339B2Adjustable de-chucking voltageAPPLIED MATERIALS INC·Filed 2023·Granted Sep 30, 2025·0 cites·18 claims
- 2765US11264213B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2019·Granted Mar 1, 2022·0 cites·20 claims
- 2863US11476093B2Plasma etching systems and methods with secondary plasma injectionAPPLIED MATERIALS INC·Filed 2019·Granted Oct 18, 2022·0 cites·20 claims
- 2961US2025308850A1Grounding plate for stress tuning high density and modulus filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3056US7841582B2Variable seal pressure slit valve doors for semiconductor manufacturing equipmentAPPLIED MATERIALS INC·Filed 2004·Granted Nov 30, 2010·4 cites·14 claims
- 3155US10468285B2High temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 5, 2019·0 cites·19 claims
- 3248US2016225652A1Low temperature chuck for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3347US2011120017A1Variable seal pressure slit valve doors for semiconductor manufacturing equipmentAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3446US2009120584A1Counter-balanced substrate supportAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3544US2004089420A1Bypass set up for integration of remote optical endpoint for CVD chamberAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 3643US2019304756A1Semiconductor chamber coatings and processesAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3741US2021183620A1Chamber with inductive power sourceAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3841US2003027428A1Bypass set up for integration of remote optical endpoint for CVD chamberAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 3941US2019119815A1Systems and processes for plasma filteringAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4039US2004163590A1In-situ health check of liquid injection vaporizerAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 4136US2018025900A1Alkali metal and alkali earth metal reductionAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4236US2009000550A1Manifold assemblyAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4333US6273140B1Cluster valve for semiconductor wafer processing systemsAPPLIED MATERIALS INC·Filed 1999·Granted Aug 14, 2001·4 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →