Inventor · disambiguated record
Toru Tsuchihashi
Also filed as: TSUCHIHASHI TORU
30 granted patents·10 pending applications·97 citations·filing 2000–2022
95Inventor score
Top patents by PatentIndex Score
40 records- 0197US8900791B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 2, 2014·23 cites·21 claims
- 0295US7625690B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 1, 2009·24 cites·19 claims
- 0393US8546063B2Organic solvent development or multiple development pattern-forming method using electron beams or EUV raysTSUBAKI HIDEAKI·Filed 2010·Granted Oct 1, 2013·10 cites·33 claims
- 0491US10663864B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted May 26, 2020·4 cites·11 claims
- 0582US10788754B2Pattern forming method and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Sep 29, 2020·2 cites·13 claims
- 0680US8637222B2Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist patternTSUCHIHASHI TORU·Filed 2010·Granted Jan 28, 2014·4 cites·16 claims
- 0779US8084187B2Resist composition and pattern forming method using the sameMIZUTANI KAZUYOSHI·Filed 2009·Granted Dec 27, 2011·5 cites·12 claims
- 0878US6894108B1Fine polymer particles for plastisol, process for producing the same, and halogen-free plastisol composition and article made with the sameMITSUBISHI RAYON CO·Filed 2000·Granted May 17, 2005·12 cites·16 claims
- 0977US11042094B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Jun 22, 2021·1 cites·10 claims
- 1073US10890847B2Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Jan 12, 2021·1 cites·13 claims
- 1173US8889339B2Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanksTSUCHIHASHI TORU·Filed 2013·Granted Nov 18, 2014·2 cites·12 claims
- 1272US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 1371US10761426B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted Sep 1, 2020·1 cites·11 claims
- 1466US12306538B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2021·Granted May 20, 2025·0 cites·5 claims
- 1565US9217919B2Photosensitive composition, pattern-forming method using the composition, and resin used in the compositionTAKAHASHI HIDENORI·Filed 2009·Granted Dec 22, 2015·1 cites·26 claims
- 1664US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 1758US10962884B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Mar 30, 2021·0 cites·8 claims
- 1858US9563121B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the compositionFUJIFILM CORP·Filed 2014·Granted Feb 7, 2017·0 cites·13 claims
- 1958US2022179312A1Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 2057US10562991B2Developer, pattern forming method, and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Feb 18, 2020·0 cites·14 claims
- 2156US10599038B2Rinsing liquid, pattern forming method, and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Mar 24, 2020·0 cites·8 claims
- 2255US7923196B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Apr 12, 2011·4 cites·17 claims
- 2354US9417530B2Method for developing resist, method for forming a resist pattern, method for producing a mold, and developing fluid utilized in these methodsFUJIFILM CORP·Filed 2014·Granted Aug 16, 2016·0 cites·20 claims
- 2454US2022308449A1Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 2547USRE42563EFine polymer particles for plastisol, process for producing the same, and halogen-free plastisol composition and article made with the sameMITSUBISHI RAYON CO·Filed 2000·Granted Jul 19, 2011·0 cites·16 claims
- 2645US2008081292A1Resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 2744US2014030656A1Method for forming resist patterns and method for producing patterned substratesFUJIFILM CORP·Filed 2013·Application pending·0 cites
- 2843US10394127B2Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Aug 27, 2019·0 cites·12 claims
- 2942US8968988B2Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomaskTSUCHIHASHI TORU·Filed 2012·Granted Mar 3, 2015·0 cites·13 claims
- 3042US2013045440A1Resist pattern forming method, resist pattern, crosslinking negative chemical-amplification resist composition for organic solvent development, nanoimprint mold, and photomaskFUJIFILM CORP·Filed 2012·Application pending·0 cites
- 3141US2018120697A1Actinic ray-sensitive or radiation-sensitive composition, and actinic ray-sensitive or radiation-sensitive composition film using the compositionFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3240US8906600B2Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomaskTSUCHIHASHI TORU·Filed 2012·Granted Dec 9, 2014·0 cites·15 claims
- 3339US2017285482A1Organic processing liquid and pattern forming methodFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3439US2018101100A1Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3538US10126653B2Pattern forming method and resist compositionIWATO KAORU·Filed 2011·Granted Nov 13, 2018·0 cites·20 claims
- 3637US8349535B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewithFUJIFILM CORP·Filed 2010·Granted Jan 8, 2013·0 cites·9 claims
- 3736US9632410B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Apr 25, 2017·0 cites·11 claims
- 3836US2012003585A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUBAKI HIDEAKI·Filed 2010·Application pending·0 cites
- 3935US2012094235A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUCHIHASHI TORU·Filed 2010·Application pending·0 cites
- 4033US8852845B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resinTAKAHASHI HIDENORI·Filed 2009·Granted Oct 7, 2014·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →