Inventor · disambiguated record
Toshihiro Tsuruta
Also filed as: TSURUTA TOSHIHIRO
1 granted patent·1 pending application·0 citations·filing 2017–2024
1Inventor score
Files withTOKYO ELECTRON LTD2
Top patents by PatentIndex Score
2 records- 0152US2024212987A1Gas supply system, gas control system, plasma processing apparatus, and gas control methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0239US10316835B2Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →