Inventor · disambiguated record
Toshiyuki Uno
Also filed as: UNO TOSHIYUKI
26 granted patents·7 pending applications·89 citations·filing 1988–2025
95Inventor score
Top patents by PatentIndex Score
33 records- 0194US12216397B2Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofAGC INC·Filed 2023·Granted Feb 4, 2025·2 cites·20 claims
- 0293US11822229B2Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofAGC INC·Filed 2021·Granted Nov 21, 2023·2 cites·18 claims
- 0393US11698580B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted Jul 11, 2023·2 cites·17 claims
- 0493US8288062B2Reflective mask blank for EUV lithographyHAYASHI KAZUYUKI·Filed 2012·Granted Oct 16, 2012·9 cites·23 claims
- 0593US8029950B2Reflective mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2010·Granted Oct 4, 2011·13 cites·24 claims
- 0689US8168352B2Reflective mask blank for EUV lithography and mask for EUV lithographyHAYASHI KAZUYUKI·Filed 2011·Granted May 1, 2012·9 cites·44 claims
- 0788US10254640B2Reflective element for mask blank and process for producing reflective element for mask blankASAHI GLASS CO LTD·Filed 2017·Granted Apr 9, 2019·3 cites·21 claims
- 0888US7960077B2Reflective-type mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2010·Granted Jun 14, 2011·11 cites·24 claims
- 0984US12298660B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 1081US12216398B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Feb 4, 2025·0 cites·9 claims
- 1181US11953822B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2023·Granted Apr 9, 2024·0 cites·18 claims
- 1280US12038685B2Reflective mask blank for EUV lithographyAGC INC·Filed 2023·Granted Jul 16, 2024·0 cites·18 claims
- 1379US12124164B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Oct 22, 2024·0 cites·7 claims
- 1479US7678511B2Reflective-type mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2006·Granted Mar 16, 2010·6 cites·62 claims
- 1579US2025216765A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing sameAGC INC·Filed 2025·Application pending·0 cites
- 1677US2025004360A1Reflective mask blank and reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 1772US11914283B2Reflective mask blank and reflective maskAGC INC·Filed 2022·Granted Feb 27, 2024·0 cites·9 claims
- 1871US7230695B2Defect repair device and defect repair methodASAHI GLASS CO LTD·Filed 2004·Granted Jun 12, 2007·10 cites·31 claims
- 1969US9097976B2Reflective mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2013·Granted Aug 4, 2015·1 cites·20 claims
- 2069US9086629B2Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2013·Granted Jul 21, 2015·1 cites·19 claims
- 2169US2024201576A1Reflective mask blank for euv lithographyAGC INC·Filed 2024·Application pending·0 cites
- 2267US4888945AMethod for quality control of textured yarnMURATA MACHINERY LTD·Filed 1988·Granted Dec 26, 1989·7 cites·26 claims
- 2366US11982935B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted May 14, 2024·0 cites·20 claims
- 2466US7712333B2Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithographyASAHI GLASS CO LTD·Filed 2006·Granted May 11, 2010·2 cites·19 claims
- 2566US5588602APackage changing system for supplying and discharging loaded and empty packages to and from a machine frameMURATA MACHINERY LTD·Filed 1994·Granted Dec 31, 1996·6 cites·11 claims
- 2664US2024152044A1Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 2763US8956787B2Reflective mask blank for EUV lithography and process for producing the sameUNO TOSHIYUKI·Filed 2012·Granted Feb 17, 2015·1 cites·21 claims
- 2858US2022299862A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing mask blank and maskAGC INC·Filed 2022·Application pending·0 cites
- 2956US2023288794A1Reflection-type mask blank for euv lithography, reflection-type mask for euv lithography, and manufacturing methods thereforAGC INC·Filed 2023·Application pending·0 cites
- 3048US11036127B2Reflective mask blank and reflective maskAGC INC·Filed 2018·Granted Jun 15, 2021·0 cites·9 claims
- 3145US6383695B1Black matrix for liquid crystal display devices and color filterASAHI GLASS CO LTD·Filed 2001·Granted May 7, 2002·1 cites·20 claims
- 3244US2007087578A1Ion beam sputtering apparatus and film deposition method for a multilayer for a reflective-type mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2006·Application pending·0 cites
- 3338US4993219AFalse twist processing apparatusMURATA MACHINERY LTD·Filed 1989·Granted Feb 19, 1991·3 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →