Inventor · disambiguated record
Travis Koh
Also filed as: KOH TRAVIS · KOH TRAVIS LEE
15 granted patents·5 pending applications·316 citations·filing 2014–2025
93Inventor score
Top patents by PatentIndex Score
20 records- 0199US10312048B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·48 cites·19 claims
- 0298US11728124B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·5 cites·13 claims
- 0398US11069504B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2020·Granted Jul 20, 2021·7 cites·21 claims
- 0498US10685807B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2019·Granted Jun 16, 2020·38 cites·16 claims
- 0597US10923320B2System for tunable workpiece biasing in a plasma reactorAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·33 cites·20 claims
- 0697US10373804B2System for tunable workpiece biasing in a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·87 cites·18 claims
- 0796US10904996B2Substrate support with electrically floating power supplyAPPLIED MATERIALS INC·Filed 2017·Granted Jan 26, 2021·43 cites·19 claims
- 0896US10714372B2System for coupling a voltage to portions of a substrateAPPLIED MATERIALS INC·Filed 2017·Granted Jul 14, 2020·44 cites·20 claims
- 0989US9613783B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·7 cites·20 claims
- 1088US10115566B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2017·Granted Oct 30, 2018·4 cites·12 claims
- 1164US2021134561A1System for tunable workpiece biasing in a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1262US12094707B2Plasma enhanced CVD with periodic high voltage biasAPPLIED MATERIALS INC·Filed 2020·Granted Sep 17, 2024·0 cites·12 claims
- 1359US10840086B2Plasma enhanced CVD with periodic high voltage biasAPPLIED MATERIALS INC·Filed 2018·Granted Nov 17, 2020·0 cites·17 claims
- 1456US2023352264A1Creating Ion Energy Distribution Functions (IEDF)DORF LEONID·Filed 2023·Application pending·0 cites
- 1555US2025308848A1Plasma processing system configured to deliver a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1653US12456611B2Systems and methods for controlling a voltage waveform at a substrate during plasma processingAPPLIED MATERIALS INC·Filed 2017·Granted Oct 28, 2025·0 cites·13 claims
- 1750US9659751B2System and method for selective coil excitation in inductively coupled plasma processing reactorsAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·0 cites·19 claims
- 1846US10249479B2Magnet configurations for radial uniformity tuning of ICP plasmasAPPLIED MATERIALS INC·Filed 2015·Granted Apr 2, 2019·0 cites·17 claims
- 1945US2020340858A1Plasma emission monitoring system with cross-dispersion gratingAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2038US2019088518A1Substrate support with cooled and conducting pinsAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →