Inventor · disambiguated record
Tsai-Sheng Gau
Also filed as: GAU TSAI-SHENG
126 granted patents·15 pending applications·1,186 citations·filing 1998–2024
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG66TAIWAN SEMICONDUCTOR MFG CO LTD55IND TECH RES INST3LIN BURN JENG2LIU GEORGE2
Top patents by PatentIndex Score
141 records- 0199US9153478B2Spacer etching process for integrated circuit designTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 6, 2015·118 cites·20 claims
- 0299US8216767B2Patterning process and chemical amplified photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2009·Granted Jul 10, 2012·110 cites·19 claims
- 0398US8658344B2Patterning process and photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2012·Granted Feb 25, 2014·93 cites·19 claims
- 0497US9773676B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 26, 2017·17 cites·19 claims
- 0597US9177797B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·28 cites·20 claims
- 0696US9418868B1Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·11 cites·20 claims
- 0796US8837810B2System and method for alignment in semiconductor device fabricationCHEN YEN-LIANG·Filed 2012·Granted Sep 16, 2014·82 cites·20 claims
- 0896US8835323B1Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 16, 2014·22 cites·20 claims
- 0996US7266803B2Layout generation and optimization to improve photolithographic performanceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Sep 4, 2007·82 cites·30 claims
- 1096US7091502B2Apparatus and method for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Aug 15, 2006·72 cites·23 claims
- 1195US12050399B2Pellicle assembly and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 1295US8943445B2Method of merging color sets of layoutTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 27, 2015·29 cites·20 claims
- 1394US10049918B2Directional patterning methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 14, 2018·9 cites·20 claims
- 1494US10014175B2Lithography using high selectivity spacers for pitch reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 3, 2018·7 cites·20 claims
- 1594US8962464B1Self-alignment for using two or more layers and methods of forming sameTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Feb 24, 2015·16 cites·20 claims
- 1693US8381139B2Method for metal correlated via split for double patterningTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 19, 2013·12 cites·20 claims
- 1791US8381153B2Dissection splitting with optical proximity correction and mask rule check enforcementTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Feb 19, 2013·21 cites·20 claims
- 1890US9852908B2Methods for integrated circuit design and fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 26, 2017·4 cites·20 claims
- 1990US8631379B2Decomposing integrated circuit layoutCHEN PI-TSUNG·Filed 2010·Granted Jan 14, 2014·21 cites·14 claims
- 2090US8431291B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Apr 30, 2013·5 cites·16 claims
- 2190US8264662B2In-line particle detection for immersion lithographyCHEN LI-JUI·Filed 2007·Granted Sep 11, 2012·17 cites·16 claims
- 2290US6361909B1Illumination aperture filter design using superpositionIND TECH RES INST·Filed 1999·Granted Mar 26, 2002·82 cites·20 claims
- 2389US9991132B2Lithographic technique incorporating varied pattern materialsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 5, 2018·5 cites·20 claims
- 2489US9449880B1Fin patterning methods for increased process marginTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 20, 2016·6 cites·20 claims
- 2589US2024379358A1Methods for integrated circuit design and fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2688US9911623B2Via connection to a partially filled trenchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 6, 2018·4 cites·20 claims
- 2788US9245763B2Mechanisms for forming patterns using multiple lithography processesTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jan 26, 2016·6 cites·20 claims
- 2888US9054159B2Method of patterning a feature of a semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 9, 2015·7 cites·19 claims
- 2988US7851774B2System and method for direct writing to a waferTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Dec 14, 2010·9 cites·20 claims
- 3087US12394633B2Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 19, 2025·0 cites·20 claims
- 3187US12159092B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 3, 2024·0 cites·20 claims
- 3287US10515823B2Via connection to a partially filled trenchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 24, 2019·3 cites·20 claims
- 3387US10163654B2Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·3 cites·8 claims
- 3487US8038897B2Method and system for wafer inspectionTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Oct 18, 2011·8 cites·13 claims
- 3586US10324369B2Methods for generating a mandrel maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 18, 2019·4 cites·19 claims
- 3686US9747408B2Generating final mask pattern by performing inverse beam technology processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 29, 2017·5 cites·20 claims
- 3786US9684236B1Method of patterning a film layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 20, 2017·4 cites·20 claims
- 3886US7934177B2Method and system for a pattern layout splitTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Apr 26, 2011·19 cites·22 claims
- 3985US9418199B2Method and apparatus for extracting systematic defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·4 cites·20 claims
- 4085US9362132B2Systems and methods for a sequential spacer schemeTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jun 7, 2016·4 cites·20 claims
- 4185US7450296B2Method and system for patterning alignment marks on a transparent substrateTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Nov 11, 2008·13 cites·12 claims
- 4285US2024213034A1Via connection to a partially filled trenchTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4384US7732109B2Method and system for improving critical dimension uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 8, 2010·6 cites·21 claims
- 4483US9735140B2Systems and methods for a sequential spacer schemeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 15, 2017·2 cites·20 claims
- 4583US8179536B2Measurement of overlay offset in semiconductor processingHUANG TE-CHIH·Filed 2010·Granted May 15, 2012·6 cites·20 claims
- 4683US7234128B2Method for improving the critical dimension uniformity of patterned features on wafersTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 19, 2007·21 cites·38 claims
- 4782US9911606B2Mandrel spacer patterning in multi-pitch integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 6, 2018·3 cites·20 claims
- 4882US9502261B2Spacer etching process for integrated circuit designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 22, 2016·2 cites·20 claims
- 4982US9337083B2Multi-layer metal contactsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 10, 2016·5 cites·20 claims
- 5082US8762899B2Method for metal correlated via split for double patterningLIN BURN JENG·Filed 2013·Granted Jun 24, 2014·4 cites·20 claims
Showing the top 50 of 141 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →