Inventor · disambiguated record
Tseng-Chung Lee
Also filed as: LEE TSENG-CHUNG
12 granted patents·4 pending applications·684 citations·filing 1993–2018
93Inventor score
Top patents by PatentIndex Score
16 records- 0191US5739909AMeasurement and control of linewidths in periodic structures using spectroscopic ellipsometryLUCENT TECHNOLOGIES INC·Filed 1995·Granted Apr 14, 1998·240 cites·18 claims
- 0289US5654903AMethod and apparatus for real time monitoring of wafer attributes in a plasma etch processLUCENT TECHNOLOGIES INC·Filed 1995·Granted Aug 5, 1997·136 cites·25 claims
- 0383US5835221AProcess for fabricating a device using polarized light to determine film thicknessLUCENT TECHNOLOGIES INC·Filed 1996·Granted Nov 10, 1998·56 cites·10 claims
- 0482US5653894AActive neural network determination of endpoint in a plasma etch processLUCENT TECHNOLOGIES INC·Filed 1995·Granted Aug 5, 1997·80 cites·5 claims
- 0579US10353408B2System for and method of fast pulse gas deliveryDING JUNHUA·Filed 2012·Granted Jul 16, 2019·5 cites·19 claims
- 0677US10126760B2System for and method of fast pulse gas deliveryMKS INSTR INC·Filed 2014·Granted Nov 13, 2018·4 cites·22 claims
- 0768US10969799B2System for and method of fast pulse gas deliveryMKS INSTR INC·Filed 2018·Granted Apr 6, 2021·1 cites·44 claims
- 0867US5494697AProcess for fabricating a device using an ellipsometric techniqueAT & T CORP·Filed 1993·Granted Feb 27, 1996·44 cites·9 claims
- 0965US6228277B1Etch endpoint detectionLUCENT TECHNOLOGIES INC·Filed 1998·Granted May 8, 2001·32 cites·14 claims
- 1065US6021215ADynamic data visualizationLUCENT TECHNOLOGIES INC·Filed 1997·Granted Feb 1, 2000·43 cites·16 claims
- 1161US5877407APlasma etch end point detection processLUCENT TECHNOLOGIES INC·Filed 1997·Granted Mar 2, 1999·24 cites·12 claims
- 1260US6750495B1Damascene capacitors for integrated circuitsAGERE SYSTEMS INC·Filed 1999·Granted Jun 15, 2004·19 cites·7 claims
- 1351US2008135069A1Method and apparatus for active particle and contaminant removal in wet clean processes in semiconductor manufacturingLU WEI·Filed 2007·Application pending·0 cites
- 1450US2008135070A1Method and apparatus for active particle and contaminant removal in wet clean processes in semiconductor manufacturingLU WEI·Filed 2006·Application pending·0 cites
- 1549US2008163905A1Two step process for post ash cleaning for Cu/low-k dual damascene structure with metal hard maskTANG JIANSHE·Filed 2007·Application pending·0 cites
- 1648US2008163897A1Two step process for post ash cleaning for cu/low-k dual damascene structure with metal hard maskAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →