Inventor · disambiguated record
Tsunenaga Nakashima
Also filed as: NAKASHIMA TSUNENAGA
22 granted patents·6 pending applications·103 citations·filing 2005–2025
94Inventor score
Top patents by PatentIndex Score
28 records- 0189US9984904B2Substrate treatment system, substrate transfer method and computer storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 29, 2018·5 cites·10 claims
- 0289US7287920B2Semiconductor manufacturing apparatus and methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 30, 2007·15 cites·13 claims
- 0387US9460942B2Substrate treatment system, substrate transfer method and computer storage mediumTOKYO ELECTRON LTD·Filed 2012·Granted Oct 4, 2016·7 cites·11 claims
- 0486US10643872B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted May 5, 2020·5 cites·10 claims
- 0585US7640885B2Liquid processing method and liquid processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Jan 5, 2010·8 cites·3 claims
- 0684US9984905B2Substrate treatment system, substrate transfer method and computer storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 29, 2018·3 cites·18 claims
- 0784US9287145B2Substrate treatment system, substrate transfer method, and a non-transitory computer storage mediumTOKYO ELECTRON LTD·Filed 2012·Granted Mar 15, 2016·7 cites·9 claims
- 0883US8469285B2Chemical liquid supply nozzle and chemical liquid supply methodNAKASHIMA TSUNENAGA·Filed 2010·Granted Jun 25, 2013·7 cites·15 claims
- 0982US7752999B2Wet processing system, wet processing method and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jul 13, 2010·10 cites·21 claims
- 1075USD690330SCoating and developing apparatusTSUCHIYAMA MASASHI·Filed 2012·Granted Sep 24, 2013·26 cites·1 claims
- 1172US7547614B2Solution treatment apparatus and solution treatment methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 16, 2009·4 cites·15 claims
- 1270US10807027B2Treatment solution supply apparatus and substrate treatment systemTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·1 cites·10 claims
- 1368US11865590B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·0 cites·4 claims
- 1464US8236378B2Wet processing system, wet processing method and storage mediumNAKASHIMA TSUNENAGA·Filed 2010·Granted Aug 7, 2012·2 cites·14 claims
- 1560US8511331B2Process liquid feed mechanismNAKASHIMA TSUNENAGA·Filed 2011·Granted Aug 20, 2013·3 cites·9 claims
- 1658US11504751B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Nov 22, 2022·0 cites·4 claims
- 1757US11630392B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Apr 18, 2023·0 cites·4 claims
- 1857US2023402303A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1955US12131919B2Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 29, 2024·0 cites·15 claims
- 2053US7736498B2Solution treatment apparatus and solution treatment methodTOKYO ELECTRON LTD·Filed 2009·Granted Jun 15, 2010·0 cites·2 claims
- 2153US2006233952A1Liquid processing method and liquid processing apparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2253US2015096682A1Chemical liquid container replacement device, container mounting module, chemical liquid container replacement method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2352US7984690B2Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jul 26, 2011·0 cites·26 claims
- 2451US12398461B2Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 26, 2025·0 cites·8 claims
- 2551US2025266269A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2648US2024429068A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2746US8354141B2Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage mediumTOKYO ELECTRON LTD·Filed 2011·Granted Jan 15, 2013·0 cites·22 claims
- 2845US2008289715A1Complex pipe and coating/development processing apparatus equipped with complex pipeTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →