Inventor · disambiguated record
Tsiao-Chen Wu
Also filed as: WU TSIAO-CHEN
25 granted patents·3 pending applications·456 citations·filing 2000–2025
95Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD15TAIWAN SEMICONDUCTOR MFG8LU HSIAO-TZU2CHANG SHU-HAO1HSU PEI-CHENG1
Top patents by PatentIndex Score
28 records- 0197US11402761B2Semiconductor lithography system and/or methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 2, 2022·4 cites·20 claims
- 0297US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 0396US11243461B2Reflective mask and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 8, 2022·5 cites·20 claims
- 0494US8765330B2Phase shift mask for extreme ultraviolet lithography and method of fabricating sameSHIH CHIA-TSUNG·Filed 2012·Granted Jul 1, 2014·85 cites·20 claims
- 0591US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 0687US12321100B2Semiconductor lithography system and/or methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jun 3, 2025·0 cites·20 claims
- 0787US2025291257A1Semiconductor lithography system and/or methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0886US9864270B2Pellicle and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 9, 2018·3 cites·20 claims
- 0985US12038684B2Reflective mask and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 16, 2024·0 cites·20 claims
- 1080US11921430B2Semiconductor lithography system and/or methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 1179US11630386B2Reflective mask and fabricating method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 18, 2023·0 cites·20 claims
- 1279US8394576B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2012·Granted Mar 12, 2013·2 cites·20 claims
- 1378US10509311B1Apparatus and method for generating an electromagnetic radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·1 cites·20 claims
- 1477US9389506B2Photoresist having improved extreme-ultraviolet lithography imaging performanceTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jul 12, 2016·1 cites·20 claims
- 1576US9538628B1Method for EUV power improvement with fuel droplet trajectory stabilizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 3, 2017·2 cites·17 claims
- 1676US8124323B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2007·Granted Feb 28, 2012·4 cites·20 claims
- 1772US7838173B2Structure design and fabrication on photomask for contact hole manufacturing process window enhancementTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Nov 23, 2010·3 cites·22 claims
- 1869US9081280B2Photoresist having improved extreme-ultraviolet lithography imaging performanceCHANG SHU-HAO·Filed 2011·Granted Jul 14, 2015·1 cites·19 claims
- 1968US6383693B1Method of forming a photomask utilizing electron beam dosage compensation method employing dummy patternTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted May 7, 2002·10 cites·16 claims
- 2064US11199767B2Apparatus and method for generating an electromagnetic radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 14, 2021·0 cites·20 claims
- 2159US8815496B2Method for patterning a photosensitive layerTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 26, 2014·0 cites·20 claims
- 2255US7169701B2Dual damascene trench formation to avoid low-K dielectric damageTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Jan 30, 2007·6 cites·26 claims
- 2352US10310380B2High-brightness light sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 4, 2019·0 cites·20 claims
- 2451US8988652B2Method and apparatus for ultraviolet (UV) patterning with reduced outgassingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2012·Granted Mar 24, 2015·0 cites·18 claims
- 2547US2010053575A1Thermal Control For EUV LithographyTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 2645US2008156346A1Method and apparatus for cleaning a substrateTAIWAN SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
- 2743US10162276B2Apparatus for shielding reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·0 cites·25 claims
- 2843US9847302B2Wafer surface conditioning for stability in fab environmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Dec 19, 2017·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →