Inventor · disambiguated record
Tsukasa Yamanaka
Also filed as: YAMANAKA TSUKASA
25 granted patents·8 pending applications·461 citations·filing 1995–2018
96Inventor score
Top patents by PatentIndex Score
33 records- 0192US7615331B2Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor deviceFUJIFILM CORP·Filed 2007·Granted Nov 10, 2009·15 cites·8 claims
- 0290US5824451APositive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted Oct 20, 1998·145 cites·20 claims
- 0389US10705428B2Organic processing liquid for patterning chemical amplification resist film, container for organic processing liquid for patterning chemical amplification resist film, and pattern forming method, method of manufacturing electronic device, and electronic device using the sameFUJIFILM CORP·Filed 2015·Granted Jul 7, 2020·4 cites·12 claims
- 0488US5837420APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Nov 17, 1998·69 cites·5 claims
- 0586US7368216B2Photosensitive resin composition and manufacturing method of semiconductor device using the sameFUJIFILM CORP·Filed 2007·Granted May 6, 2008·9 cites·9 claims
- 0685US7252924B2Positive resist composition and method of pattern formation using the sameFUJIFILM CORP·Filed 2004·Granted Aug 7, 2007·26 cites·8 claims
- 0784US11429018B2Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection methodFUJIFILM CORP·Filed 2018·Granted Aug 30, 2022·2 cites·41 claims
- 0882US5707776APositive resin composition sensitive to ultraviolet raysFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jan 13, 1998·48 cites·13 claims
- 0979US8287709B2Method and device for immersion treatment of vehicleHAGIHARA YUSUKE·Filed 2008·Granted Oct 16, 2012·6 cites·16 claims
- 1075US8133550B2Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor deviceSATO KENICHIRO·Filed 2007·Granted Mar 13, 2012·4 cites·6 claims
- 1174US10088752B2Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Oct 2, 2018·1 cites·19 claims
- 1273US5683856APositive-working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Nov 4, 1997·33 cites·5 claims
- 1365US10126651B2Pattern forming method, and, method for producing electronic device and electronic device, each using the sameFUJIFILM CORP·Filed 2015·Granted Nov 13, 2018·1 cites·9 claims
- 1465US6013411APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jan 11, 2000·32 cites·8 claims
- 1562US7371501B2Photosensitive resin composition and method for manufacturing semiconductor apparatus using the sameFUJIFILM CORP·Filed 2007·Granted May 13, 2008·1 cites·3 claims
- 1662US5939234AChemically amplified positive resist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Aug 17, 1999·21 cites·3 claims
- 1760US5698369APhotosensitive composition comprising a sulfonimide compound according to the formula R1 -SO2 -NR3 -SO2 -R2 wherein R1, R2 and R3 each represents an aromatic group or an alkyl groupFUJI PHOTO FILM CO LTD·Filed 1995·Granted Dec 16, 1997·20 cites·13 claims
- 1856US6010820APositive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jan 4, 2000·14 cites·6 claims
- 1950US6200729B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Mar 13, 2001·10 cites·6 claims
- 2049US8530003B2Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor deviceSATO KENICHIRO·Filed 2012·Granted Sep 10, 2013·0 cites·6 claims
- 2147US7348122B2Photosensitive resin composition and method for manufacturing semiconductor device using the sameFUJIFILM CORP·Filed 2006·Granted Mar 25, 2008·0 cites·8 claims
- 2244US2007254243A1Method for manufacturing photosensitive resin composition and relief pattern using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 2344US2007166643A1Photosensitive resin composition and manufacturing method of semiconductor device using the sameFUJIFILM CORP·Filed 2006·Application pending·0 cites
- 2441US2015197663A1Self-organizing composition for forming pattern, method for forming pattern by self-organization of block copolymer using same, and patternFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 2540US7749678B2Photosensitive composition and pattern forming method using the sameFUJIFILM CORP·Filed 2005·Granted Jul 6, 2010·0 cites·10 claims
- 2640US7241551B2Positive-working resist compositionFUJIFILM CORP·Filed 2004·Granted Jul 10, 2007·0 cites·11 claims
- 2738US2013101812A1Method of forming patternKAMIMURA SOU·Filed 2011·Application pending·0 cites
- 2837US2017184973A1Organic treatment liquid for patterning resist film, method of producing organic treatment liquid for patterning resist film, storage container of organic treatment liquid for patterning resist film, pattern forming method using the same, and method of producing electronic deviceFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 2936US9885956B2Pattern forming method, and, electronic device producing method and electronic device, each using the sameFUJIFILM CORP·Filed 2015·Granted Feb 6, 2018·0 cites·10 claims
- 3036US2016033870A1Pattern formation method, electronic-device manufacturing method, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 3136US2016077440A1Pattern peeling method, electronic device and method for manufacturing the sameFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 3235US9810981B2Pattern formation method, etching method, electronic device manufacturing method, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 7, 2017·0 cites·13 claims
- 3334US2016054658A1Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →