Inventor · disambiguated record
Udo Nothelfer
Also filed as: NOTHELFER UDO
7 granted patents·4 pending applications·165 citations·filing 1995–2018
85Inventor score
Files withZEISS CARL SMT GMBH4TRENKLER JOHANN3TELEFUNKEN MICROELECTRON2NOPPER MARKUS1ZEISS CARL SMT AG1
Top patents by PatentIndex Score
11 records- 0191US5905203AMicromechanical acceleration sensorTELEFUNKEN MICROELECTRON·Filed 1996·Granted May 18, 1999·134 cites·6 claims
- 0282US8243364B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2011·Granted Aug 14, 2012·4 cites·26 claims
- 0381US8891163B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2013·Granted Nov 18, 2014·2 cites·10 claims
- 0480US7952797B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2009·Granted May 31, 2011·6 cites·22 claims
- 0564US2018224585A1Reflective optical element and euv lithography applianceZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 0660US8537460B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2012·Granted Sep 17, 2013·0 cites·20 claims
- 0759US9910193B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2014·Granted Mar 6, 2018·0 cites·25 claims
- 0856US5623099ATwo-element semiconductor capacitive acceleration sensorTELEFUNKEN MICROELECTRON·Filed 1995·Granted Apr 22, 1997·19 cites·12 claims
- 0950US2006066940A1Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2005·Application pending·0 cites
- 1040US2004250572A1Method for producing radiation-resistant quartz glass material, and quartz glass materialZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1137US2007178690A1Semiconductor device comprising a metallization layer stack with a porous low-k material having an enhanced integrityNOPPER MARKUS·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →