Inventor · disambiguated record
Ulrich Schoenhoff
Also filed as: SCHOENHOFF ULRICH
14 granted patents·3 pending applications·59 citations·filing 2009–2023
90Inventor score
Top patents by PatentIndex Score
17 records- 0193US8325322B2Optical correction deviceHAUF MARKUS·Filed 2010·Granted Dec 4, 2012·16 cites·20 claims
- 0292US8508854B2Optical element and methodEVA ERIC·Filed 2010·Granted Aug 13, 2013·12 cites·59 claims
- 0387US9304404B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 5, 2016·5 cites·53 claims
- 0486US9568837B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 14, 2017·2 cites·20 claims
- 0585US8786826B1Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 22, 2014·5 cites·29 claims
- 0683US8891172B2Optical element and methodEVA ERIC·Filed 2009·Granted Nov 18, 2014·7 cites·7 claims
- 0780US9081292B2Arrangement for actuating an element in a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Jul 14, 2015·3 cites·41 claims
- 0879US9841682B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Dec 12, 2017·1 cites·20 claims
- 0976US9448384B2Arrangement for mounting an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Sep 20, 2016·3 cites·27 claims
- 1075US10185221B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Jan 22, 2019·1 cites·20 claims
- 1171US9410662B2Arrangement for mounting an optical element, in particular in an EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Aug 9, 2016·3 cites·25 claims
- 1268US10108097B2Arrangement for manipulating the position of an elementZEISS CARL SMT GMBH·Filed 2017·Granted Oct 23, 2018·1 cites·21 claims
- 1358US2014300882A1Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1449US11703770B2Compensation of creep effects in an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Granted Jul 18, 2023·0 cites·22 claims
- 1548US2021405358A1Compensation of creep effects in an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Application pending·0 cites
- 1647US2023279919A1Vibration isolator for supporting a payloadZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1741US10838306B2Optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Nov 17, 2020·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →