Inventor · disambiguated record
Ulrich Wegmann
Also filed as: WEGMANN ULRICH
44 granted patents·12 pending applications·476 citations·filing 2001–2019
98Inventor score
Top patents by PatentIndex Score
56 records- 0195US7760366B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2008·Granted Jul 20, 2010·34 cites·17 claims
- 0294US7233386B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2005·Granted Jun 19, 2007·16 cites·33 claims
- 0393US7796274B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Sep 14, 2010·21 cites·34 claims
- 0492US7336371B1Apparatus and method for measuring the wavefront of an optical systemZEISS CARL SMT AG·Filed 2004·Granted Feb 26, 2008·49 cites·14 claims
- 0592US7333216B2Apparatus for wavefront detectionZEISS CARL SMT AG·Filed 2001·Granted Feb 19, 2008·46 cites·47 claims
- 0690US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 0790US7408652B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2005·Granted Aug 5, 2008·12 cites·30 claims
- 0889US7301646B2Device and method for the determination of imaging errors and microlithography projection exposure systemZEISS CARL SMT AG·Filed 2005·Granted Nov 27, 2007·13 cites·20 claims
- 0988US7570345B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2007·Granted Aug 4, 2009·7 cites·4 claims
- 1087US7352452B2Method and apparatus for setting optical imaging properties by means of radiation treatmentZEISS CARL SMT AG·Filed 2005·Granted Apr 1, 2008·18 cites·21 claims
- 1187US7286245B2Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyserZEISS CARL SMT AG·Filed 2003·Granted Oct 23, 2007·28 cites·21 claims
- 1286US7436521B2Optical measuring apparatus and operating method for imaging error correction in an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Oct 14, 2008·9 cites·17 claims
- 1386US7088458B1Apparatus and method for measuring an optical imaging system, and detector unitZEISS CARL SMT AG·Filed 2003·Granted Aug 8, 2006·33 cites·14 claims
- 1485US10697852B2Measuring method and measuring system for interferometrically measuring the imaging qualityZEISS CARL SMT GMBH·Filed 2019·Granted Jun 30, 2020·3 cites·18 claims
- 1585US10502545B2Measuring method and measuring arrangement for an imaging optical systemZEISS CARL SMT GMBH·Filed 2017·Granted Dec 10, 2019·4 cites·18 claims
- 1684US8004690B2Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2005·Granted Aug 23, 2011·7 cites·24 claims
- 1784US7158237B2Interferometric measuring device and projection exposure installation comprising such measuring deviceZEISS CARL SMT AG·Filed 2004·Granted Jan 2, 2007·19 cites·40 claims
- 1884US7075633B2Method and system for measuring the imaging quality of an optical imaging systemZEISS CARL SMT AG·Filed 2002·Granted Jul 11, 2006·22 cites·75 claims
- 1983US7623218B2Method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2005·Granted Nov 24, 2009·7 cites·21 claims
- 2082US7283204B2Method of producing an optical imaging systemZEISS CARL SMT AG·Filed 2003·Granted Oct 16, 2007·20 cites·30 claims
- 2179US7417745B2Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometryZEISS CARL SMT AG·Filed 2004·Granted Aug 26, 2008·21 cites·4 claims
- 2278US8537333B2Optical imaging device with image defect determinationFREIMANN ROLF·Filed 2011·Granted Sep 17, 2013·2 cites·23 claims
- 2377US7365861B2Method and apparatus for determining telecentricity and microlithography projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Apr 29, 2008·4 cites·15 claims
- 2477US7277182B2Apparatus for polarization-specific examination, optical imaging system, and calibration methodZEISS CARL SMT AG·Filed 2004·Granted Oct 2, 2007·15 cites·28 claims
- 2577US7230220B2Method of determining optical properties and projection exposure system comprising a wavefront detection systemZEISS CARL SMT AG·Filed 2006·Granted Jun 12, 2007·6 cites·26 claims
- 2676US8488127B2System for measuring the image quality of an optical imaging systemMENGEL MARKUS·Filed 2010·Granted Jul 16, 2013·2 cites·38 claims
- 2775US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 2874US10386728B2Device and method for wavefront analysisZEISS CARL SMT GMBH·Filed 2018·Granted Aug 20, 2019·1 cites·19 claims
- 2972US8786849B2Method for measuring an optical systemZEISS CARL SMT GMBH·Filed 2013·Granted Jul 22, 2014·2 cites·31 claims
- 3072US7307707B2Method and system for measuring the imaging quality of an optical imaging systemZEISS CARL SMT AG·Filed 2006·Granted Dec 11, 2007·5 cites·13 claims
- 3171US7456933B2Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Nov 25, 2008·3 cites·39 claims
- 3270US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 3369US7019824B2Moire method and measuring system for measuring the distortion of an optical imaging systemZEISS CARL SMT AG·Filed 2004·Granted Mar 28, 2006·11 cites·33 claims
- 3466US8120763B2Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2009·Granted Feb 21, 2012·1 cites·14 claims
- 3562US8654346B2Optical scattering disk, use thereof, and wavefront measuring apparatusWEGMANN ULRICH·Filed 2012·Granted Feb 18, 2014·1 cites·31 claims
- 3662US7911624B2Device and method for the interferometric measurement of phase masksZEISS CARL SMS GMBH·Filed 2006·Granted Mar 22, 2011·3 cites·35 claims
- 3761US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 3861US9429495B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT GMBH·Filed 2014·Granted Aug 30, 2016·0 cites·22 claims
- 3960US9235131B2Optical imaging device with image defect determinationZEISS CARL SMT GMBH·Filed 2013·Granted Jan 12, 2016·0 cites·28 claims
- 4060US8823948B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT GMBH·Filed 2013·Granted Sep 2, 2014·0 cites·20 claims
- 4159US9996014B2Optical imaging device with image defect determinationZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·0 cites·23 claims
- 4259US8836929B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT GMBH·Filed 2012·Granted Sep 16, 2014·0 cites·15 claims
- 4359US8199333B2Optical scattering disk, use thereof, and wavefront measuring apparatusWEGMANN ULRICH·Filed 2006·Granted Jun 12, 2012·2 cites·23 claims
- 4457US8134716B2Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methodsEMER WOLFGANG·Filed 2006·Granted Mar 13, 2012·3 cites·26 claims
- 4557US2009021726A1Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4657US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4755US2012113429A1Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2012·Application pending·0 cites
- 4854US2008144043A1Apparatus for wavefront detectionZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4952US2008037905A1Method and apparatus for determining the influencing of the state of polarization by an optical system, and an analyserZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 5051US2008130012A1Device and method for the determination of imaging errors and microlithography projection exposure systemZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
Showing the top 50 of 56 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Ulrich Wegmann files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →