Inventor · disambiguated record
Vikram M. Bhosle
Also filed as: BHOSLE VIKRAM · BHOSLE VIKRAM M
15 granted patents·10 pending applications·14 citations·filing 2013–2024
87Inventor score
Files withAPPLIED MATERIALS INC14VARIAN SEMICONDUCTOR EQUIPMENT ASS INC8VARIAN SEMICONDUCTOR EQUIPMENT3
Top patents by PatentIndex Score
25 records- 0186US9865430B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 9, 2018·3 cites·12 claims
- 0282US9524849B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Dec 20, 2016·4 cites·11 claims
- 0380US9887067B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Feb 6, 2018·2 cites·13 claims
- 0478US10290466B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·1 cites·19 claims
- 0574US9034743B2Method for implant productivity enhancementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 19, 2015·3 cites·14 claims
- 0666US9478679B2Dielectric coating of the edge of a solar cellVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Oct 25, 2016·1 cites·13 claims
- 0764US12351900B2Plasma based film modification for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Granted Jul 8, 2025·0 cites·11 claims
- 0862US11615945B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2021·Granted Mar 28, 2023·0 cites·10 claims
- 0961US10446371B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Oct 15, 2019·0 cites·11 claims
- 1061US2025338641A1Deep trench sidewall passivation using conformal plasma doping and low-temperature thermal treatmentsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1160US12165852B2Cover ring to mitigate carbon contamination in plasma doping chamberAPPLIED MATERIALS INC·Filed 2022·Granted Dec 10, 2024·0 cites·15 claims
- 1259US2025372379A1Hard mask stress modulation using low energy implantAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1358US2025218742A1Rf blocker for uniformity controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1457US10804075B2Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Oct 13, 2020·0 cites·4 claims
- 1557US2025112043A1LOW ENERGY TREATMENT TO PASSIVATE SiC SUBSTRATE DEFECTSAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1657US2014273330A1Method of forming single side textured semiconductor workpiecesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Application pending·0 cites
- 1757US2025040186A1High-temperature implant for gate-all-around devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1856US11120973B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2019·Granted Sep 14, 2021·0 cites·6 claims
- 1956US2025385083A1Methods and system for duty factor ramped timed ion implant matchingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2055US2024035154A1Fluorine based cleaning for plasma doping applicationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2154US2024274404A1System and Method for Reducing Particle Formation in a Process Chamber of an Ion ImplanterAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2252US2024006158A1Co-doping to control wet etch rate of fcvd oxide layersAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2350US11501972B2Sacrificial capping layer for passivation using plasma-based implant processAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·0 cites·24 claims
- 2443US9196489B2Ion implantation based emitter profile engineering via process modificationsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Nov 24, 2015·0 cites·8 claims
- 2540US9780250B2Self-aligned mask for ion implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Oct 3, 2017·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →