Inventor · disambiguated record
Vi Vuong
Also filed as: VUONG VI
40 granted patents·5 pending applications·627 citations·filing 2002–2024
98Inventor score
Top patents by PatentIndex Score
45 records- 0197US6609086B1Profile refinement for integrated circuit metrologyTIMBRE TECH INC·Filed 2002·Granted Aug 19, 2003·113 cites·76 claims
- 0295US7330279B2Model and parameter selection for optical metrologyTIMBRE TECH INC·Filed 2002·Granted Feb 12, 2008·58 cites·52 claims
- 0393US7388677B2Optical metrology optimization for repetitive structuresTIMBRE TECH INC·Filed 2005·Granted Jun 17, 2008·26 cites·29 claims
- 0492US10910201B1Synthetic wavelengths for endpoint detection in plasma etchingTOKYO ELECTRON LTD·Filed 2019·Granted Feb 2, 2021·7 cites·22 claims
- 0592US7327475B1Measuring a process parameter of a semiconductor fabrication process using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Feb 5, 2008·19 cites·41 claims
- 0692US7126700B2Parametric optimization of optical metrology modelTIMBRE TECH INC·Filed 2003·Granted Oct 24, 2006·59 cites·56 claims
- 0791US7588949B2Optical metrology model optimization based on goalsTOKYO ELECTRON LTD·Filed 2007·Granted Sep 15, 2009·11 cites·23 claims
- 0891US7171284B2Optical metrology model optimization based on goalsTIMBRE TECH INC·Filed 2004·Granted Jan 30, 2007·49 cites·55 claims
- 0989US7467064B2Transforming metrology data from a semiconductor treatment system using multivariate analysisTIMBRE TECH INC·Filed 2006·Granted Dec 16, 2008·16 cites·22 claims
- 1089US7092110B2Optimized model and parameter selection for optical metrologyTIMBRE TECH INC·Filed 2003·Granted Aug 15, 2006·68 cites·46 claims
- 1188US9330990B2Method of endpoint detection of plasma etching process using multivariate analysisTOKYO ELECTRON LTD·Filed 2013·Granted May 3, 2016·10 cites·10 claims
- 1287US7417750B2Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometerTOKYO ELECTRON LTD·Filed 2006·Granted Aug 26, 2008·11 cites·26 claims
- 1386US10692705B2Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamberTOKYO ELECTRON LTD·Filed 2016·Granted Jun 23, 2020·5 cites·23 claims
- 1486US10002804B2Method of endpoint detection of plasma etching process using multivariate analysisTOKYO ELECTRON LTD·Filed 2016·Granted Jun 19, 2018·5 cites·9 claims
- 1585US7526354B2Managing and using metrology data for process and equipment controlTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·10 cites·31 claims
- 1683US8346506B2Transforming metrology data from a semiconductor treatment system using multivariate analysisTOKYO ELECTRON LTD·Filed 2012·Granted Jan 1, 2013·4 cites·4 claims
- 1782US7505153B2Model and parameter selection for optical metrologyTIMBRE TECH INC·Filed 2008·Granted Mar 17, 2009·5 cites·19 claims
- 1882US6853942B2Metrology hardware adaptation with universal libraryTIMBRE TECH INC·Filed 2002·Granted Feb 8, 2005·20 cites·62 claims
- 1980US8170833B2Transforming metrology data from a semiconductor treatment system using multivariate analysisVUONG VI·Filed 2008·Granted May 1, 2012·9 cites·11 claims
- 2080US7474420B2In-die optical metrologyTIMBRE TECH INC·Filed 2006·Granted Jan 6, 2009·11 cites·34 claims
- 2179US7522294B2Measuring a process parameter of a semiconductor fabrication process using optical metrologyTOKYO ELECTRON LTD·Filed 2008·Granted Apr 21, 2009·5 cites·22 claims
- 2279US7216045B2Selection of wavelengths for integrated circuit optical metrologyTIMBRE TECH INC·Filed 2002·Granted May 8, 2007·22 cites·2 claims
- 2378US7783669B2Data flow management in generating profile models used in optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Aug 24, 2010·11 cites·17 claims
- 2476US8577820B2Accurate and fast neural network training for library-based critical dimension (CD) metrologyJIN WEN·Filed 2011·Granted Nov 5, 2013·8 cites·18 claims
- 2576US8452718B2Determination of training set size for a machine learning systemJIN WEN·Filed 2010·Granted May 28, 2013·9 cites·25 claims
- 2676US2024419885A1Hybrid modeling for film metrologyTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2775US7522295B2Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometerTOKYO ELECTRON LTD·Filed 2006·Granted Apr 21, 2009·4 cites·26 claims
- 2875US6842261B2Integrated circuit profile value determinationTIMBRE TECH INC·Filed 2002·Granted Jan 11, 2005·14 cites·45 claims
- 2972US7428044B2Drift compensation for an optical metrology toolTOKYO ELECTRON LTD·Filed 2006·Granted Sep 23, 2008·3 cites·29 claims
- 3071US9607265B2Accurate and fast neural network training for library-based critical dimension (CD) metrologyJIN WEN·Filed 2013·Granted Mar 28, 2017·5 cites·8 claims
- 3167US7525673B2Optimizing selected variables of an optical metrology systemTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·5 cites·31 claims
- 3267US7495781B2Optimizing selected variables of an optical metrology modelTOKYO ELECTRON LTD·Filed 2006·Granted Feb 24, 2009·2 cites·30 claims
- 3366US2025060324A1Hybrid x-ray and optical metrology and navigationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3465US7515282B2Modeling and measuring structures with spatially varying properties in optical metrologyTIMBRE TECH INC·Filed 2005·Granted Apr 7, 2009·5 cites·19 claims
- 3564US7616325B2Optical metrology optimization for repetitive structuresTOKYO ELECTRON LTD·Filed 2008·Granted Nov 10, 2009·3 cites·20 claims
- 3664US7505148B2Matching optical metrology tools using spectra enhancementTOKYO ELECTRON LTD·Filed 2006·Granted Mar 17, 2009·1 cites·37 claims
- 3763US7523021B2Weighting function to enhance measured diffraction signals in optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Apr 21, 2009·4 cites·18 claims
- 3863US7394554B2Selecting a hypothetical profile to use in optical metrologyTIMBRE TECH INC·Filed 2003·Granted Jul 1, 2008·10 cites·32 claims
- 3946US7765234B2Data flow management in generating different signal formats used in optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Jul 27, 2010·0 cites·26 claims
- 4046US2008013107A1Generating a profile model to characterize a structure to be examined using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 4144US7474993B2Selection of wavelengths for integrated circuit optical metrologyTIMBRE TECH INC·Filed 2007·Granted Jan 6, 2009·0 cites·20 claims
- 4243US7765076B2Allocating processing units to processing clusters to generate simulated diffraction signalsTOKYO ELECTRON LTD·Filed 2006·Granted Jul 27, 2010·0 cites·21 claims
- 4338US7742888B2Allocating processing units to generate simulated diffraction signals used in optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Jun 22, 2010·0 cites·24 claims
- 4437US2018286643A1Advanced optical sensor, system, and methodologies for etch processing monitoringTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 4537US2004090629A1Diffraction order selection for optical metrology simulationFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →