Inventor · disambiguated record
Vladimir Kamenov
Also filed as: KAMENOV VLADIMIR
18 granted patents·11 pending applications·35 citations·filing 2003–2018
91Inventor score
Top patents by PatentIndex Score
29 records- 0186US7239450B2Method of determining lens materials for a projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jul 3, 2007·16 cites·48 claims
- 0275US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 0375US8446665B2Catadioptric projection objectiveEPPLE ALEXANDER·Filed 2009·Granted May 21, 2013·2 cites·26 claims
- 0471US7456933B2Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Nov 25, 2008·3 cites·39 claims
- 0570US7321465B2Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Jan 22, 2008·5 cites·19 claims
- 0666US9063439B2Projection objective for microlithography with stray light compensation and related methodsGOEHNERMEIER AKSEL·Filed 2009·Granted Jun 23, 2015·2 cites·40 claims
- 0766US2018373006A1Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 0865US9921483B2Surface correction of mirrors with decoupling coatingZEISS CARL SMT GMBH·Filed 2015·Granted Mar 20, 2018·1 cites·20 claims
- 0962US8486590B2Reflective mask for EUV lithographyKAMENOV VLADIMIR·Filed 2012·Granted Jul 16, 2013·1 cites·29 claims
- 1062US8339576B2Projection objective of a microlithographic projection exposure apparatusLOERING ULRICH·Filed 2012·Granted Dec 25, 2012·1 cites·20 claims
- 1161US10281824B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted May 7, 2019·0 cites·24 claims
- 1261US9726870B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2016·Granted Aug 8, 2017·0 cites·17 claims
- 1361US8873137B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2013·Granted Oct 28, 2014·0 cites·32 claims
- 1460US7961297B2Method for determining intensity distribution in the image plane of a projection exposure arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Jun 14, 2011·1 cites·25 claims
- 1560US2014293256A1Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1659US10042146B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted Aug 7, 2018·0 cites·20 claims
- 1759US9279969B2Catadioptric projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·0 cites·19 claims
- 1859US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 1955US2017322343A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 2055US2014320955A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 2153US2008297754A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2252US2009115986A1Microlithography projection objectiveZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 2345US9733395B2Microlithographic projection exposure apparatusKAMENOV VLADIMIR·Filed 2011·Granted Aug 15, 2017·0 cites·29 claims
- 2445US2005270659A1Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lensALBERT MICHAEL·Filed 2005·Application pending·0 cites
- 2544US7355791B2Optical system and photolithography tool comprising sameZEISS CARL SMT AG·Filed 2005·Granted Apr 8, 2008·0 cites·28 claims
- 2641US2004227988A1Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lensFiled 2003·Application pending·0 cites
- 2738US2005190446A1Catadioptric reduction objectiveCARL ZEISS AMT AG·Filed 2004·Application pending·0 cites
- 2837US2006238735A1Optical system of a projection exposure apparatusKAMENOV VLADIMIR·Filed 2006·Application pending·0 cites
- 2935US2004218271A1Retardation element made from cubic crystal and an optical system therewithZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →