Inventor · disambiguated record
Wataru Okase
Also filed as: OKASE WATARU
34 granted patents·4 pending applications·1,959 citations·filing 1991–2012
98Inventor score
Top patents by PatentIndex Score
38 records- 0198US6497767B1Thermal processing unit for single substrateTOKYO ELECTRON LTD·Filed 2000·Granted Dec 24, 2002·398 cites·15 claims
- 0298US5862302AThermal processing apparatus having a reaction tube with transparent and opaque portionsTOKYO ELECTRON LTD·Filed 1997·Granted Jan 19, 1999·362 cites·3 claims
- 0396US5884009ASubstrate treatment systemTOKYO ELECTRON LTD·Filed 1998·Granted Mar 16, 1999·249 cites·27 claims
- 0495US5592581AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jan 7, 1997·131 cites·22 claims
- 0590US6473993B1Thermal treatment method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 5, 2002·53 cites·9 claims
- 0688US6402848B1Single-substrate-treating apparatus for semiconductor processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·48 cites·11 claims
- 0786US6399922B2Single-substrate-heat-treating apparatus for semiconductor process systemTOKYO ELECTRON LTD·Filed 2001·Granted Jun 4, 2002·36 cites·14 claims
- 0884US6756565B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2001·Granted Jun 29, 2004·24 cites·6 claims
- 0983US6121579AHeating apparatus, and processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Sep 19, 2000·81 cites·37 claims
- 1083US5554226AHeat treatment processing apparatus and cleaning method thereofTOKYO ELECTRON LTD·Filed 1995·Granted Sep 10, 1996·54 cites·4 claims
- 1180US8381755B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameFUJIKIN KK·Filed 2012·Granted Feb 26, 2013·5 cites·2 claims
- 1280US8210022B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameMORIYA SHUJI·Filed 2008·Granted Jul 3, 2012·9 cites·7 claims
- 1379US6322631B1Heat treatment method and its apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 27, 2001·22 cites·2 claims
- 1478US5329095AThermal treatment apparatus utilizing heated lidTOKYO ELECTRON LTD·Filed 1993·Granted Jul 12, 1994·65 cites·22 claims
- 1576US5429498AHeat treatment method and apparatus thereofTEL SAGAMI LTD·Filed 1992·Granted Jul 4, 1995·51 cites·4 claims
- 1675US8434522B2Fluid control apparatusOKASE WATARU·Filed 2008·Granted May 7, 2013·9 cites·1 claims
- 1773US6228173B1Single-substrate-heat-treating apparatus for semiconductor process systemTOKYO ELECTRON LTD·Filed 1999·Granted May 8, 2001·38 cites·5 claims
- 1873US5749723AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1995·Granted May 12, 1998·27 cites·24 claims
- 1971US5903711AHeat treatment apparatus and heat treatment methodTOYKO ELECTRON LIMITED·Filed 1997·Granted May 11, 1999·47 cites·18 claims
- 2070US6716329B2Processing apparatus and processing systemTOKYO ELECTRON LTD·Filed 2001·Granted Apr 6, 2004·6 cites·7 claims
- 2170US5279670AVertical type diffusion apparatusTEL SAGAMI LTD·Filed 1991·Granted Jan 18, 1994·59 cites·20 claims
- 2269US5662469AHeat treatment methodTOKYO ELECTRON TOHOKU KABUSHIK·Filed 1995·Granted Sep 2, 1997·37 cites·10 claims
- 2368US6949719B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2004·Granted Sep 27, 2005·10 cites·14 claims
- 2467US5651670AHeat treatment method and apparatus thereofTEL SAGAMI LTD·Filed 1994·Granted Jul 29, 1997·34 cites·8 claims
- 2565US5359148AHeat-treating apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Oct 25, 1994·36 cites·16 claims
- 2658US5678989AHeat treatment method using a vertical processing tubeTOKYO ELECTRON LTD·Filed 1996·Granted Oct 21, 1997·19 cites·6 claims
- 2757US6634370B2Liquid treatment system and liquid treatment methodTOKYO ELECTRON LTD·Filed 2001·Granted Oct 21, 2003·6 cites·11 claims
- 2852US7112268B2Plating device and plating methodTOKYO ELECTRON LTD·Filed 2002·Granted Sep 26, 2006·3 cites·16 claims
- 2949US6036482AHeat treatment methodTOKYO ELECTRON LTD·Filed 1996·Granted Mar 14, 2000·15 cites·19 claims
- 3048US5571010AHeat treatment method and apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Nov 5, 1996·15 cites·11 claims
- 3147US6740164B2Plating apparatus and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2002·Granted May 25, 2004·1 cites·6 claims
- 3244US6641709B2Mist trap mechanism and method for plating apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Nov 4, 2003·0 cites·6 claims
- 3344US5427625AMethod for cleaning heat treatment processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Jun 27, 1995·9 cites·6 claims
- 3443US6953522B2Liquid treatment method using alternating electrical contactsTOKYO ELECTRON LTD·Filed 2001·Granted Oct 11, 2005·0 cites·2 claims
- 3543US2004053509A1Fluid treatment systemFiled 2002·Application pending·0 cites
- 3639US2003141016A1Exhaust system for processing apparatusFiled 2003·Application pending·0 cites
- 3735US2001037945A1Liquid treatment equipment and liquid treatment methodFiled 2001·Application pending·0 cites
- 3831US2007187868A1Pasting method and pasting apparatusARUGA TSUYOSHI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →