Inventor · disambiguated record
Wataru Takayama
Also filed as: TAKAYAMA WATARU
7 granted patents·3 pending applications·95 citations·filing 2014–2025
83Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD10
Top patents by PatentIndex Score
10 records- 0196US10707090B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Jul 7, 2020·41 cites·20 claims
- 0296US9666446B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 30, 2017·43 cites·13 claims
- 0383US9966273B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 8, 2018·3 cites·8 claims
- 0480US9779961B2Etching methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 3, 2017·4 cites·12 claims
- 0574US10692729B2Etching process methodTOKYO ELECTRON LTD·Filed 2017·Granted Jun 23, 2020·2 cites·15 claims
- 0664US9230824B2Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Granted Jan 5, 2016·2 cites·14 claims
- 0755US2025226183A1Plasma treatment device and etching methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0845US10867777B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 15, 2020·0 cites·20 claims
- 0945US2025157798A1Control program, information processing program, control method, information processing method, plasma processing device, and information processing deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1041US2019304824A1Plasma processing apparatus and method of transferring workpieceTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →