Inventor · disambiguated record
Wenya Fan
Also filed as: FAN WENYA
6 granted patents·8 pending applications·64 citations·filing 1999–2015
79Inventor score
Top patents by PatentIndex Score
14 records- 0180US6214746B1Nanoporous material fabricated using a dissolvable reagentHONEYWELL INT INC·Filed 1999·Granted Apr 10, 2001·52 cites·18 claims
- 0267US7951696B2Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processesHONEYWELL INT INC·Filed 2008·Granted May 31, 2011·3 cites·31 claims
- 0364US8324089B2Compositions for forming doped regions in semiconductor substrates, methods for fabricating such compositions, and methods for forming doped regions using such compositionsLEUNG ROGER YU-KWAN·Filed 2010·Granted Dec 4, 2012·2 cites·15 claims
- 0458US7915181B2Repair and restoration of damaged dielectric materials and filmsHONEYWELL INT INC·Filed 2004·Granted Mar 29, 2011·7 cites·26 claims
- 0551US8518170B2Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inksLEUNG ROGER YU-KWAN·Filed 2008·Granted Aug 27, 2013·0 cites·17 claims
- 0649US2013240794A1Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inksHONEYWELL INT INC·Filed 2013·Application pending·0 cites
- 0746US2009239363A1Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processesHONEYWELL INT INC·Filed 2008·Application pending·0 cites
- 0845US2009026924A1Methods of making low-refractive index and/or low-k organosilicate coatingsLEUNG ROGER Y·Filed 2007·Application pending·0 cites
- 0945US2010035422A1Methods for forming doped regions in a semiconductor materialHONEYWELL INT INC·Filed 2008·Application pending·0 cites
- 1043US8975170B2Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositionsZHOU LIGUI·Filed 2011·Granted Mar 10, 2015·0 cites·18 claims
- 1139US2009111925A1Thermal interface materials, methods of production and uses thereofBURNHAM KIKUE S·Filed 2007·Application pending·0 cites
- 1239US2006051929A1Electrical properties of shallow trench isolation materials via high temperature annealing in the presence of reactive gasesHONEYWELL INT INC·Filed 2004·Application pending·0 cites
- 1336US2015126653A1Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositionsZHOU LIGUI·Filed 2015·Application pending·0 cites
- 1434US2005173803A1Interlayer adhesion promoter for low k materialsFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →