Inventor · disambiguated record
Weihong Liu
Also filed as: LIU WEIHONG
17 granted patents·15 pending applications·40 citations·filing 2007–2024
89Inventor score
Files withMERCK PATENT GMBH8LIU WEIHONG5AZ ELECTRONIC MATERIALS USA2STOWELL JEFFREY2AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1
Top patents by PatentIndex Score
32 records- 0188US8039201B2Antireflective coating composition and process thereofAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Oct 18, 2011·11 cites·17 claims
- 0285US12486883B2Internal magnetic control device, flywheel assembly and fitness equipmentNINGBO DELCONIX TECH CO LTD·Filed 2022·Granted Dec 2, 2025·1 cites·2 claims
- 0384US8841062B2Positive working photosensitive materialLIU WEIHONG·Filed 2012·Granted Sep 23, 2014·6 cites·20 claims
- 0483US9012126B2Positive photosensitive materialLIU WEIHONG·Filed 2012·Granted Apr 21, 2015·5 cites·18 claims
- 0583US8906594B2Negative-working thick film photoresistCHEN CHUNWEI·Filed 2012·Granted Dec 9, 2014·7 cites·12 claims
- 0677US10773182B2Multi-stage evaporation system enhanced by a gravity-reduced fieldNANJING UNIVERSITY OF TECHNOLOGY·Filed 2018·Granted Sep 15, 2020·2 cites·7 claims
- 0777US9252893B2Methods for determining a beam-forming gain parameter, user equipment, base station, computer programs and computer program productsLIU WEIHONG·Filed 2011·Granted Feb 2, 2016·6 cites·14 claims
- 0871US11066805B2Measuring device and method for horizontal dynamic impedance of specified foundation depth based on differential response analysis of pulse excitationUNIV DALIAN TECH·Filed 2018·Granted Jul 20, 2021·2 cites·2 claims
- 0960US2025244669A1Compositions and methods of improving metal structure fabrication by wet chemical etchMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1059US2023112024A1Dnq-free chemically amplified resist compositionMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1159US2025274899A1Positioning method, device, and storage mediumZTE CORP·Filed 2023·Application pending·0 cites
- 1259US2025028245A1Positive tone ultra thick photoresist compositionMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1353US11822242B2DNQ-type photoresist composition including alkali-soluble acrylic resinsMERCK PATENT GMBH·Filed 2020·Granted Nov 21, 2023·0 cites·19 claims
- 1453US2022342308A1Positive working photosensitive materialsMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 1552US2010137467A1Polyurethane foam containing flame-retardant mixtureSTOWELL JEFFREY K·Filed 2007·Application pending·0 cites
- 1651US2010092894A1Bottom Antireflective Coating CompositionsLIU WEIHONG·Filed 2008·Application pending·0 cites
- 1749US11043001B2High precision object location in a parking lotBLACK SESAME INTERNATIONAL HOLDING LTD·Filed 2019·Granted Jun 22, 2021·0 cites·16 claims
- 1849US2009035704A1Underlayer Coating Composition Based on a Crosslinkable PolymerZHUANG HONG·Filed 2007·Application pending·0 cites
- 1949US2017176856A1Negative-working photoresist compositions for laser ablation and use thereofAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
- 2049US2011250544A1Bottom antireflective coating compositionsAZ ELECTRONIC MATERIALS USA·Filed 2011·Application pending·0 cites
- 2148US10976662B2Positive working photosensitive materialAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Apr 13, 2021·0 cites·38 claims
- 2248US10705424B2Negative-working photoresist compositions for laser ablation and use thereofAZ ELECTRONIC MAT LUXEMBOURG S AR L·Filed 2017·Granted Jul 7, 2020·0 cites·7 claims
- 2346US12058534B2Method of measuring AAS EMFERICSSON TELEFON AB L M·Filed 2020·Granted Aug 6, 2024·0 cites·9 claims
- 2446US2024401759A1Imitation-shaped lampLao Yecheng·Filed 2024·Application pending·0 cites
- 2545US2010015550A1Dual damascene via filling compositionLIU WEIHONG·Filed 2008·Application pending·0 cites
- 2644US12393115B2Positive working photosensitive materialMERCK PATENT GMBH·Filed 2019·Granted Aug 19, 2025·0 cites·19 claims
- 2744US2010137465A1Phosphate ester flame retardant and resins containing sameSTOWELL JEFFREY·Filed 2008·Application pending·0 cites
- 2844US2010063169A1Phosphoramide ester flame retardant and resins containing sameSTOWELL JEFFREY·Filed 2008·Application pending·0 cites
- 2942US12276909B2Novolak/DNQ based, chemically amplified photoresistMERCK PATENT GMBH·Filed 2019·Granted Apr 15, 2025·0 cites·17 claims
- 3041US11698586B2Negative-working ultra thick film photoresistMERCK PATENT GMBH·Filed 2019·Granted Jul 11, 2023·0 cites·22 claims
- 3138US11385543B2Enviromentally stable, thick film, chemically amplified resistRIDGEFIELD ACQUISITION·Filed 2017·Granted Jul 12, 2022·0 cites·21 claims
- 3230US2013303150A1Apparatus and Method for Saving Power of Base StationsLI MINGXIN·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Weihong Liu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →