Inventor · disambiguated record
Wenjin Shao
Also filed as: SHAO WENJIN
17 granted patents·1 pending application·120 citations·filing 2009–2020
93Inventor score
Top patents by PatentIndex Score
18 records- 0195US8874423B2Model-based scanner tuning systems and methodsASML NETHERLANDS BV·Filed 2013·Granted Oct 28, 2014·9 cites·26 claims
- 0294US9588439B1Information matrix creation and calibration test pattern selection based on computational lithography model parametersBRUGUIER ANTOINE JEAN·Filed 2011·Granted Mar 7, 2017·38 cites·24 claims
- 0394US8571845B2Model-based scanner tuning systems and methodsCAO YU·Filed 2009·Granted Oct 29, 2013·15 cites·13 claims
- 0493US8887105B1Calibration pattern selection based on noise sensitivityBRUGUIER ANTOINE JEAN·Filed 2012·Granted Nov 11, 2014·15 cites·20 claims
- 0592US8694928B2Pattern selection for lithographic model calibrationCAO YU·Filed 2009·Granted Apr 8, 2014·12 cites·12 claims
- 0689US8806387B2Model-based process simulation systems and methodsCAO YU·Filed 2009·Granted Aug 12, 2014·7 cites·18 claims
- 0788US8930172B2Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibrationYE JUN·Filed 2009·Granted Jan 6, 2015·6 cites·27 claims
- 0886US10025885B2Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibrationASML NETHERLANDS BV·Filed 2015·Granted Jul 17, 2018·2 cites·20 claims
- 0984US10846442B2Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibrationASML NETHERLANDS BV·Filed 2018·Granted Nov 24, 2020·1 cites·20 claims
- 1084US8379991B2Delta TCC for fast sensitivity model computationASML NETHERLANDS BV·Filed 2009·Granted Feb 19, 2013·5 cites·18 claims
- 1180US8682059B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodCAO YU·Filed 2013·Granted Mar 25, 2014·2 cites·14 claims
- 1276US10025198B2Smart selection and/or weighting of parameters for lithographic process simulationCAO YU·Filed 2009·Granted Jul 17, 2018·5 cites·23 claims
- 1375US10137643B2Model-based process simulation systems and methodsASML NETHERLANDS BV·Filed 2014·Granted Nov 27, 2018·1 cites·25 claims
- 1473US8447095B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodCAO YU·Filed 2009·Granted May 21, 2013·2 cites·14 claims
- 1567US2020189192A1Model-based scanner tuning systems and methodsASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1662US9672301B2Pattern selection for lithographic model calibrationASML NETHERLANDS BV·Filed 2014·Granted Jun 6, 2017·0 cites·20 claims
- 1761US8942463B2Harmonic resist model for use in a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 27, 2015·0 cites·26 claims
- 1859US10569469B2Model-based scanner tuning systems and methodsASML NETHERLANDS BV·Filed 2014·Granted Feb 25, 2020·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →